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2020
DOI: 10.3390/electronics9122198
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A Two-Stage X-Band 20.7-dBm Power Amplifier in 40-nm CMOS Technology

Abstract: For higher integration density, X-band power amplifiers (PAs) with CMOS technology have been widely discussed in recent publications. However, with reduced power supply voltage and device size, it is a great challenge to design a compact PA with high output power and power-added efficiency (PAE). In the proposed design, a 40-nm standard CMOS process is used for higher integration with other RF building blocks, compared with other CMOS PA designs with larger process node. Transistor cells are designed with neut… Show more

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Cited by 3 publications
(3 citation statements)
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“…Ref. [15] showed a better EC performance, while our work had advantages in peak output power as well as wide-band performance. In addition, PA in this work occupied a smallest core-area among the listed ones, and the compactly designed TF networks contributed a lot.…”
Section: Large Signal Measurementmentioning
confidence: 74%
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“…Ref. [15] showed a better EC performance, while our work had advantages in peak output power as well as wide-band performance. In addition, PA in this work occupied a smallest core-area among the listed ones, and the compactly designed TF networks contributed a lot.…”
Section: Large Signal Measurementmentioning
confidence: 74%
“…Many of them were based on a high supply voltage (2.8~3.6 V), and only ref. [15,16] reported PAs operating on a lower power supply (1.0/1.2 V). The fabricated PA in this work exhibited higher EC (Psat/V 2 sup) performance than most of listed works.…”
Section: Large Signal Measurementmentioning
confidence: 99%
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