A survey of technical literature on adhesive applications for optics

Prabhu, K; Schmitz, Tony L.; Ifju, Peter; Daly, John G.

doi:10.1117/12.735948

Cited by 13 publications

(4 citation statements)

References 40 publications

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“…Such optics are common in systems that operate at visible wavelengths, but are practically nonexistent in the IR. This is due in part to the often extreme mismatch in thermal expansion behavior for common IR materials and a lack of commercially available IR transparent adhesive in spite of historic [29][30][31] and more recent 32,33 work in this area.…”

Section: Pseudogrin Lens Demonstrationmentioning

confidence: 99%

Diffusion-based gradient index optics for infrared imaging

et al. 2020

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New moldable, infrared (IR) transmitting glasses and diffusion-based gradient index (GRIN) optical glasses enable simultaneous imaging across multiple wavebands including shortwave infrared, midwave infrared, and long-wave infrared, and offer potential for both weight savings and increased performance in optical sensors. Lens designs show potential for significant reduction in size and weight and improved performance using these materials in homogeneous and GRIN lens elements in multiband sensors. An IR-GRIN lens with Δn ¼ 0.2 is demonstrated. © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Section: Pseudogrin Lens Demonstrationmentioning

confidence: 99%

Diffusion-based gradient index optics for infrared imaging

et al. 2020

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“…Moreover, the bonding strength degradation of organic adhesives which occurs over time because of humidity and water ingress also presents difficulties. 3) Furthermore, in optics for lasers, laser beams with a short wavelength or short pulse width are known to destroy optical thin films because of photon absorption and thermal diffusion. Especially for optical application for UV-wavelength continuous-wave laser beams or femtosecond pulsed lasers, optical thin films consisting of a larger bandgap are used.…”

Section: Introductionmentioning

confidence: 99%

Atomic diffusion bonding with oxide underlayers using Al and amorphous Si films for high optical density applications

Yonezawa

Uomoto

Shimatsu

2022

Jpn. J. Appl. Phys.

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Atomic diffusion bonding with oxide underlayers using Al and a-Si films was examined to create a bonded interface with Al2O3 and Si-oxides having large band gaps for high optical density applications. Surface free energy of the bonded interface greater than 2 J/m2 and 100% light transmittance were achieved after annealing at 300°C in the range of film thicknesses δ on both sides from 0.3 nm to 0.5 nm using Al films and with δ of around 0.5 nm using a-Si films. Structural analyses revealed that the bonded interface consists of Al2O3 and Si-oxides with oxygen dissociated from oxide underlayers.

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“…In addition, bonding interface is also required to meet optical index matching at the bonded interface to avoid Fresnel's loss 7) like that optical adhesive with refractive index matching to substrate is selected. [8][9][10] Atomic diffusion bonding (ADB) of two flat wafers with thin metal films is a promising process to achieve room temperature wafer bonding [11][12][13][14][15] along with surface-activated bonding. [16][17][18][19] Actually, ADB can be done even with film thickness of a few angstroms on each side.…”

Section: Introductionmentioning

confidence: 99%

Atomic diffusion bonding using oxide underlayers for optical applications

Yonezawa

Takahashi

Sato

et al. 2019

Jpn. J. Appl. Phys.

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Atomic diffusion bonding of quartz glass wafers using thin Ti films, with SiO 2 underlayers on wafer surfaces, provides 100% light transmittance at the bonded interface along with strong bonding energy, after post-bonded low-temperature annealing. Cross-section images obtained using transmission electron microscopy show that the bonded interface after annealing at 350 °C consists of amorphous structure including nanocrystalline grains. Structural analysis using electron energy loss spectroscopy shows that post-bonded annealing enhances oxidation of Ti with oxygen dissociated from SiO 2 underlayers, and that Ti oxides form close to TiO 2 or Ti 4 O 7 . This oxidation provides 100% light transmittance with high bonding strength attributable to the annealing. Moreover, we applied this technique for bonding glass and sapphire wafers using SiO 2 -Nb 2 O 5 underlayers, demonstrating that 100% light transmittance and control of refractive index matching are achieved simultaneously at the

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A survey of technical literature on adhesive applications for optics

Cited by 13 publications

References 40 publications

Diffusion-based gradient index optics for infrared imaging

Diffusion-based gradient index optics for infrared imaging

Atomic diffusion bonding with oxide underlayers using Al and amorphous Si films for high optical density applications

Atomic diffusion bonding using oxide underlayers for optical applications

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