A subnanosecond 2000 gate array with ECL 100K compatibility

Satô, Fumihiko; Takahashi, Toru; Misawa, H.; Kimura, Koji

doi:10.1109/t-ed.1984.21491

Cited by 6 publications

(1 citation statement)

References 2 publications

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“…2 Methods for the electrochemical processing of copper are crucial to the advancement of the microelectronics/semiconductor industry. For example, these methods include electroplating 3 and those processes that involve the anodic dissolution of copper such as electrochemical machining (ECM), electrochemical-mechanical polishing 4,5 and classical electropolishing. [6][7][8][9] The preponderance of the methods used for the electrochemical processing of copper are based on aqueous chloride-containing solutions.…”

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Anodic Dissolution of Copper in the Acidic and Basic Aluminum Chloride 1-Ethyl-3-methylimidazolium Chloride Ionic Liquid

Reidy

Wang

Hussey

2021

J. Electrochem. Soc.

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The anodic dissolution of copper was investigated at a copper RDE in the Lewis acidic and basic composition regions of the room-temperature AlCl3-EtMeImCl ionic liquid (IL) to assess the utility of chloroaluminate liquids as solvents for the electrochemical machining and electropolishing of copper. In the Lewis acidic IL (60 mol % AlCl3), the dissolution of Cu0 proceeds under mixed kinetic-mass transport control with an exchange current density of 7.00 mA cm−2 at 306 K and an apparent activation free energy of 19.7 kJ mol−1. A formal potential of 0.843 V was obtained for the Cu+/Cu0 reaction from potentiometric measurements. In the basic IL (< 50 mol % AlCl3), potentiometric measurements showed that the oxidation of Cu0 resulted in the formation of [CuCl2]−. In this case, the formal potential of the [CuCl2]−/Cu0 reaction is −0.412 V. At small positive overpotentials, the reaction exhibited mixed control and was first order in the chloride concentration, indicating that only a single Cl− is involved in the RDS. However, at more positive overpotentials, the reaction transitions to mass transport control, and a well-defined limiting current is observed for the anodization process. This limiting current scales linearly with the free chloride concentration in the IL.

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