A study on various curvilinear data representations and their impact on mask manufacturing flow

Gharat, Sayalee; Durvasula, Bhardwaj; Pai, Ravi R.; Buck, Peter; Koranne, Sandeep; Tritchkov, Alexander

doi:10.1117/12.2588374

Cited by 4 publications

(6 citation statements)

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“…Such considerations are valid from geometric point of view. For example, a few groups have demonstrated some file size reduction using spline representation for the post-OPC masks [2][3][4][5], despite that the post-processing of the post-OPC masks may introduce additional wafer errors. However, from OPC point of view, OPC may need to generate post-OPC results with the file size as small as possible without sacrificing lithographic performance in the first place.…”

Section: Curvilinear Data Representationsmentioning

confidence: 99%

“…The CWG has focused on defining a new MULTIGON record as a proposed extension based on the SEMI P39 OASIS standard, capable of describing curvilinear geometric figures using a series of connected spline curves, as an alternative to the conventional piecewise-linear POLYGON record. Though some file size reduction by replacing piecewise-linear figures with spline-based figures has been reported by some MDP researchers using mask pattern post-processing [2][3][4][5][6], they are lacking studies from OPC perspectives to evaluate the existence of the benefit of MULTIGON format.…”

Section: Introduction 11 Backgroundmentioning

confidence: 99%

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Curvilinear data representation and its impact on file size and lithographic performance

Hu¹,

Spence²,

Wampler³

et al. 2023

DTCO and Computational Patterning II

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As the industry is developing curvilinear mask solutions, some curvilinear post-OPC masks have been reported with file sizes in excess of 10 times the corresponding Manhattan post-OPC files, which can greatly impact mask data storage, transfer and processing. Some file size reduction utilizing spline fittings has been reported in mask post-processing. However, from an OPC perspective, mask post-processing is undesirable. In this study, we show that maintaining an adequate density of mask control points (MCPs) is key to achieving the desired on-wafer lithographic performance, regardless of whether the MCPs are connected by spline sections or piecewise-linear segments. Our results suggest that) may not offer clear lithographic performance or file size benefits. We will also offer some guidance for controlling piecewise-linear file size without compromising lithographic performance.

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Section: Curvilinear Data Representationsmentioning

confidence: 99%

Section: Introduction 11 Backgroundmentioning

confidence: 99%

Curvilinear data representation and its impact on file size and lithographic performance

Hu¹,

Spence²,

Wampler³

et al. 2023

DTCO and Computational Patterning II

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“…Some of this work was previously presented at SPIE Advanced Lithography 2021 and published in the proceedings of this conference. 21,22…”

Section: Acknowledgmentsmentioning

confidence: 99%

Study on various curvilinear data representations and their impact on mask and wafer manufacturing

Choi

Ryu

Lee

et al. 2021

J. Micro/Nanopattern. Mats. Metro.

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“…The CWG has focused on defining a new MULTIGON record as a proposed extension based on the SEMI P39 OASIS standard, capable of describing curvilinear geometric figures using a series of connected spline curves, as an alternative to the conventional piecewise-linear POLYGON record. Though some file size reduction by replacing piecewise-linear figures with spline-based figures has been reported by some MDP researchers using mask pattern postprocessing, 2 – 6 they are lacking studies from OPC perspectives to evaluate the existence of the benefit of MULTIGON format.…”

Section: Introductionmentioning

confidence: 99%

“…Such considerations are valid from a geometric point of view. For example, a few groups have demonstrated some file size reduction using spline representation for the postOPC masks, 2 – 5 despite the fact that the postprocessing of the postOPC masks may introduce additional wafer errors. However, from an OPC point of view, OPC may need to generate postOPC results with the file size as small as possible without sacrificing lithographic performance in the first place.…”

Section: Introductionmentioning

confidence: 99%

Curvilinear data representation and its impact on file size and lithographic performance

Hu,

Lyons,

Spence

et al. 2024

J. Micro/Nanopattern. Mats. Metro.

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As the industry is developing curvilinear mask solutions, some curvilinear postoptical proximity correction (OPC) masks have been reported with file sizes in excess of 10 times the corresponding Manhattan postOPC files, which can greatly impact mask data storage, transfer, and processing. Some file size reduction utilizing spline fittings has been reported in mask postprocessing. However, from an OPC perspective, mask postprocessing is undesirable. In this study, we show that maintaining an adequate density of mask control points (MCPs) is key to achieving the desired on-wafer lithographic performance, regardless of whether the MCPs are connected by spline sections or piecewise-linear segments. Our results suggest that splinebased MULTIGON records (defined by the Curvilinear Working Group convened in 2019) may not offer clear lithographic performance or file size benefits. We will also offer some guidance for controlling piecewise-linear file size without compromising lithographic performance.

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A study on various curvilinear data representations and their impact on mask manufacturing flow

Cited by 4 publications

References 0 publications

Curvilinear data representation and its impact on file size and lithographic performance

Curvilinear data representation and its impact on file size and lithographic performance

Study on various curvilinear data representations and their impact on mask and wafer manufacturing

Curvilinear data representation and its impact on file size and lithographic performance

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