2006
DOI: 10.1016/j.tsf.2006.06.003
|View full text |Cite
|
Sign up to set email alerts
|

A study of nucleation, growth, texture and phase formation of electrodeposited cobalt layers and the influence of magnetic fields

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

2
40
0

Year Published

2007
2007
2021
2021

Publication Types

Select...
7
3

Relationship

0
10

Authors

Journals

citations
Cited by 42 publications
(42 citation statements)
references
References 24 publications
(39 reference statements)
2
40
0
Order By: Relevance
“…On the other hand, there are only few papers [12][13][14] which investigated the initial stages of electrocrystallization, such as nucleation and underpotential deposition (UPD) processes in the B field, because the general tenet is that the chief magnetic field effects are related to masstransport (MHD convection) and that molecular processes are hardly affected [15][16][17][18]. In our previous work [19], the surface morphology at the initial stage of Cu deposition was investigated by AFM.…”
Section: Introductionmentioning
confidence: 99%
“…On the other hand, there are only few papers [12][13][14] which investigated the initial stages of electrocrystallization, such as nucleation and underpotential deposition (UPD) processes in the B field, because the general tenet is that the chief magnetic field effects are related to masstransport (MHD convection) and that molecular processes are hardly affected [15][16][17][18]. In our previous work [19], the surface morphology at the initial stage of Cu deposition was investigated by AFM.…”
Section: Introductionmentioning
confidence: 99%
“…Though the hexagonal closed-packed structure is the most stable phase of bulk cobalt up to 420 C [26], experimental data reveal the coexistence of both fcc and hcp phases of Co in all CoeCu/Cu samples. Furthermore, a clear designation of the presence of fcc or hcp Co phase at 2q angle around 44 is not easy due to the overlap of both diffraction lines: Co fcc e 44.217 (JCPDS 15e0806) and Co hcp e 44.763 (JCPDS 05e0727).…”
Section: Film Growthmentioning
confidence: 89%
“…This then leads to a privileged grow direction. It was proposed by Krause et al [45] that adsorption of hydrogen could affect the growth mode of electrodeposited Co and a shift in the structure from fcc to hcp has been observed. The columnar growth mode in a perpendicular magnetic field could also induce stray fields above the columns.…”
Section: Discussionmentioning
confidence: 99%