2021
DOI: 10.1016/j.jallcom.2021.158755
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A simple method for synthesizing VO2 with almost coincident hysteresis loops on Si substrate containing TiO2 buffer layer

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Cited by 9 publications
(2 citation statements)
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“…This illustrates that the W dopant not only reduces the transition temperature but also reduces the width of the hysteresis loop. Previous studies suggested that ∆T is closely linked to the grain size, lattice stress, impurity phase, and crystallinity of VO 2 film [30,31]. Structural defects induced by W doping act as nucleation sites of the phase transition [32,33].…”
Section: Thermochromic Propertiesmentioning
confidence: 99%
“…This illustrates that the W dopant not only reduces the transition temperature but also reduces the width of the hysteresis loop. Previous studies suggested that ∆T is closely linked to the grain size, lattice stress, impurity phase, and crystallinity of VO 2 film [30,31]. Structural defects induced by W doping act as nucleation sites of the phase transition [32,33].…”
Section: Thermochromic Propertiesmentioning
confidence: 99%
“…In contrast, the interface between VO 2 and TiO 2 thin films deposited by a sputtering method was clearly observed. 26) Figure 3 shows XRD patterns of the fabricated thin films for different firing temperatures T f from 450 °C to 680 °C. For T f = 450 °C, two diffraction peaks at 27.6°and 28.1°are considered to correspond to rutile TiO 2 (110) and monoclinic (M1) VO 2 (011), respectively.…”
Section: Fabrication Of Vto Thin Filmsmentioning
confidence: 99%