2003
DOI: 10.1063/1.1516621
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A scanning tunneling microscopy study of dysprosium silicide nanowire growth on Si(001)

Abstract: Dysprosium disilicide can form nanowires and three dimensional (3D) islands on the Si(001) surface. The nanowire density and width are metal coverage dependent. Various superstructures are observed on the nanowires. The Si substrate is also reconstructed in either 2×4 or 2×7 superstructures. The nanowires have a minimum height of about 0.5 nm with respect to the Si surface; and the heights of the additional layers growing atop nanowires are quantized, consistent with the hexagonal AlB2 type silicide structure.… Show more

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Cited by 83 publications
(84 citation statements)
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“…2. It is known that RE deposition promotes step movement and flattening of the Si substrate especially in the vicinity of the silicide wires [19,34,41]; thus step bunches are out of the scan range of the STM micrograph. As it is obvious from the insets in Fig.…”
Section: Growth and Structure Of Wiresmentioning
confidence: 99%
“…2. It is known that RE deposition promotes step movement and flattening of the Si substrate especially in the vicinity of the silicide wires [19,34,41]; thus step bunches are out of the scan range of the STM micrograph. As it is obvious from the insets in Fig.…”
Section: Growth and Structure Of Wiresmentioning
confidence: 99%
“…The image and cross-sectional line profile can be rationalized by considering the epitaxial relationship between the hexagonal AlB 2 -type structure ( Fig. 2A) of the bulk silicide and the Si(001) substrate, as observed for the rareearth silicide wires (9)(10)(11)(12)(13). In this scenario, the AlB 2 -type structure grows in the (1100) plane orientation with its [1120] direction aligned parallel to one of the < 110 > axes of the Si(001) substrate (Fig.…”
mentioning
confidence: 99%
“…This double-domain 16 × 2 reconstruction is not a facet [29], it is unlike the two-domain 2 × 1 reconstruction of the nominally flat Si(1 0 0) surface because the two domains of the Si(1 0 0)-2 × 1 surface are formed at a single-height atomic step. Therefore, the 2D self-organization of the silicide nanomeshes cannot occur on the double-domain Si(1 0 0)-2 × 1 surface because the monatomic step would terminate the further growth of the silicide NWs [4,5].…”
Section: Coplanar Double-domain Si(1 1 0)-16 × 2 Surfacementioning
confidence: 99%
“…Because self-assembled rare-earth (RE) silicide NWs with high aspect ratios have potential applications as low-resistance interconnects in nanoelectronic devices and also exhibit highly anisotropic band structures along the NW direction [10], the controlled self-organization of perfectly-ordered RE silicide nanomeshes is one of the most important long-term goals of the bottom-up approach for well-defined crossbar nanocircuits. However, most self-organization processes of silicide nanomeshes are not entirely controllable [4,5,[11][12][13]. Moreover, the large variation in the NW sizes could substantially alter the electronic structures and the charge transport properties along their length [14,15], making these NWs inappropriate as components in largescale integrated devices for practical applications.…”
Section: Introductionmentioning
confidence: 99%
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