A Review on the effects of PVD RF sputtering parameters on rare earth oxide thin films and their applications

Abstract

This article provides a review on effect of processing parameters on the quality and performance of thin films of rare earth materials deposited through PVD RF sputtering technique. The applications of these thin films include optical, electronics, medical films, defence and renewable energy technologies. A systematic review of the literature revealed that the sputtering parameters such as plasma power and substrate temperature have the most impact on the grain size of the deposited thin films. Larger grain size was observed to be at higher sputtering power and higher substrate temperatures, while lower grain size was obtained when the sputtering power is decreased. The optical property, in particular the band energy gap (Eg) was found to improve with the film thickness. Thin films produced at higher doping concentration and subsequently annealed at higher temperature was found to increase the crystallinity of thin films.

A review on the advances in electrochemical capacitive charge storage in transition metal oxide electrodes for pseudocapacitors

“…The discharge of molecules is later deposited onto the anode of the system, resulting in a thin film nanostructure. 301 The presence of RF as a power supply is owing to the use of insulator material as the specimen to be treated. The insulator produces positive ions on the surface, resulting in glow discharge proving ineffective, hence the presence of RF as a power supply overcomes this problem making the process an RF sputtering method.…”

“…On impact, the energized argon ions generate plasma on the substrate, resulting in ejection or vaporization of surface atomic or molecular structure as a form of gaseous discharge. The discharge of molecules is later deposited onto the anode of the system, resulting in a thin film nanostructure 301 . The presence of RF as a power supply is owing to the use of insulator material as the specimen to be treated.…”

Characterization of NiOAg thin film applicated as photocatalytic degradation of methylene blue dye waste in Yogyakarta textile factory

“…In this study, the RF sputtering technique was used. Rf sputtering is an effective method for depositing high quality thin lms of oxides, carbides and nitrides of metals and Semiconductors [19]. The process is capable of obtaining high quality thin lms with high deposition rates, good adhesion, uniformity in surface morphology, ease of operation and economical for depositing even large areas at room temperature without the need for melting as in thermal spraying [20].…”