Characterization of NiOAg thin film applicated as photocatalytic degradation of methylene blue dye waste in Yogyakarta textile factory

Abstract

Thin films NiOAg were growth onto glass substrates by RF sputtering technique at the Radio Frequency of 13.56 MHz with variation of oxygen pressure. The research was conducted about preparation and characterization of NiOAg thin films, applicated as a photocatalyst degradation of methylene blue. XRD analysis showed stronger intensity (111) and (200) planes at peak 2θ of 37.660 and 43,230. EDX analysis showed the following composition, Ni = 40.45%, Ag = 13.01%, and O = 46.53%. Based on UV-Vis, it was found the band gap energy of 2.8 eV, 3.1 eV and 3.2 eV, for oxygen pressure 0.05; 0.1 and 0.15 x 10 − 2 mbar, respectively. From the experiment of degradation of methylene blue, that was taken from textile factory dye waste in Yogyakarta/Indonesia, it was obtained the best value of degradation by 91.96%.