“…NPDS is an additive process for thin film deposition [6], and FIB has various functions such as imaging, etching, implanting, and deposition [7][8][9][10][11], but in this research, FIB was used as a subtractive process for nanoscale etching. As a sample nanoscale 3D structure, Sn (metal) and Al 2 O 3 (ceramic) were deposited as a nanoscale multi-layer structure on silicon wafer using NPDS, and profile cutting was carried out using FIB.…”