A Rapid Prototyping of Real-Time Pattern Generator for Step-and-Scan Lithography Using Digital Micromirror Device

Abstract

An FPGA prototyping of real-time pattern generator for step-and-scan lithography equipment using Digital Micromirror Device (DMD) is described. It supports IM sample/sec stage position data acquisition for high-speed and high-accuracy pattern generation. It also supports arbitrary pixel-level masking to cancel the effect of DMD manufacturing variability. We have developed the sliding window at the interface of the frame buffer in order to cancel stage fluctuation. We have also developed a fast and small data converter from binary bitmap to DMD format. This pattern generator has been successfully implemented to FPGA Stratix-It EP2S180 with max clock frequency at 123.93 MHz and max DMD frame rate at 1,202 frame/sec.

Simple maskless lithography tool with a desk-top size using a liquid-crystal-display projector

“…Similar exposure systems were also proposed by other research groups [8][9][10][11][12][13]. On the other hand, many researches on exposure systems using digital micromirror devices (DMDs) instead of LCD panels were also reported [14][15][16][17][18][19]. Besides, an exposure system using grating light valves (GLVs) or spatial light modulators (SLMs) was proposed [20].…”

Arbitrary two-dimensional spectrally encoded pattern generation—a new strategy for high-speed patterned illumination imaging

“…Current techniques mainly rely on galvanometric mirrors for simple well-defined pattern generation. On the other hand, digital-mirror-devices (DMDs) or spatial light modulators (SLMs) are now gaining popularity for arbitrary pattern generation [12][13][14]. The pattern generation rate is largely limited by the mechanical mirror scanning speed or the response time of DMD/ SLMs, both of which are typically on the order of ms [13].…”