A Promising Boron-Carbon-Nitrogen Thin Film

Montasser, K.; Morita, Shinya; Hattori, Shuzo

doi:10.4028/www.scientific.net/msf.54-55.295

Cited by 13 publications

(1 citation statement)

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“…The first report of the deposition of the ternary BC x N y films by thermal CVD was by Badzian et al 131 who also used microwave plasma for this process and obtained deposits with a cubic modification as was seen by x-ray diffraction ͑XRD͒. 132 The plasma activated CVD was also used later on by Montasser et al, 133,134 Levy et al, 135 and by Besmann 136 who achieved a hardness between 4 and 33 GPa depending on the deposition conditions. Further work has shown that, similar to the deposition of hard a-C:H diamond-like hard carbon ͑DLHC͒ and c-BN, the high hardness of the BC x N y films requires an appropriate ion bombardment and an elevated deposition temperature.…”

Section: Miscellaneous Superhard Materialsmentioning

confidence: 99%

The search for novel, superhard materials

Vepřek

1999

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

1,152

261

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The recent development in the field of superhard materials with Vickers hardness of ⩾40 GPa is reviewed. Two basic approaches are outlined including the intrinsic superhard materials, such as diamond, cubic boron nitride, C3N4, carbonitrides, etc. and extrinsic, nanostructured materials for which superhardness is achieved by an appropriate design of their microstructure. The theoretically predicted high hardness of C3N4 has not been experimentally documented so far. Ceramics made of cubic boron nitride prepared at high pressure and temperature find many applications whereas thin films prepared by activated deposition from the gas phase are still in the stage of fundamental development. The greatest progress has been achieved in the field of nanostructured materials including superlattices and nanocomposites where superhardness of ⩾50 GPa was reported for several systems. More recently, nc-TiN/SiNx nanocomposites with hardness of 105 GPa were prepared, reaching the hardness of diamond. The principles of design for these materials are summarized and some unresolved questions outlined.

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Section: Miscellaneous Superhard Materialsmentioning

confidence: 99%

The search for novel, superhard materials

Vepřek

1999

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

1,152

261

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Boron Carbonitride Thin Films by PACVD of Single‐Source Precursors

Hegemann

Riedel

Dreßler

et al. 1997

Chemical Vapor Deposition

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This work investigates the influence of the carrier gases N2, Ar, and He and the influence of the applied power density (about 1-4 Wicm') on the chemical composition of boron carbonitride films deposited by a PACVD process. The plasma is activated via 13.56 MHz radio frequency. Si(100) wafers were used as substrates and pyridine-borane (PB) and triazaborabicyclodecane (TBBD) as B-C-N-forming single-source precursors. Films that were either deposited in He using a low power density or in N2 using a high power density showed comparable properties. Analysis of these films showed their chemical composition to be BC4N. Moreover, they exhibited outstanding hardnesses of up to 64 GPa. A simple model describing the acceleration of B, C , and N ions in the plasma towards the substrate showed comparable ion momenta by use of the corresponding deposition parameters. Basically, it was found that, the higher the ion momentum, the higher the film hardness.

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Preparation and characterization of cubic boron nitride and metal boron nitride films*

Gissler

1994

Surface & Interface Analysis

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Boron nitride has generated much scientific interest due both to the outstanding material properties of its cubic modification (c-BN) which can be compared with those of diamond, and to its metal (M) boron nitride compounds (M-B-N) which have extraordinary mechanical properties such as high hardness and high elasticity. This paper compares and discusses both of these thin film materials, concentrating in particular on their preparation and their mechanical properties in view of future applications as wear-resistant coatings.There is a strong indication that the mechanism of c-BN film formation by commonly used physical vapour deposition (PVD) methods is based on recoil implantation of surface atoms into deeper layers. This process creates considerable compressive stress compromising the production of technologically valuable coatings of c-BN composition. On the other hand BN-based transition metal films can be made as hard as or even harder than c-BN films if suitable preparation methods are applied which promote nanometric grain sizes and a mixed phase composition. This paper discusses: (1) Ti implantation into hexagonal BN layers; (2) co-sputter deposition from a Ti and Hf target, respectively, and from a BN target; and (3) Ti/BN multilayer interdiffusion. M-B-N films show good adhesion to metallic substrates such as HSS steels, and preliminary wear tests with a pin-on-disk tribometer indicate promising characteristics.Bonding and chemical composition of the films were investigated by electron spectroscopy for chemical analysis (ESCA)-Auger spectroscopy, the structure and crystallite size by glancing angle x-ray diffractometry, and the hardness and elasticity by the nanoindentation technique.

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A Promising Boron-Carbon-Nitrogen Thin Film

Cited by 13 publications

References 0 publications

The search for novel, superhard materials

The search for novel, superhard materials

Boron Carbonitride Thin Films by PACVD of Single‐Source Precursors

Preparation and characterization of cubic boron nitride and metal boron nitride films*

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