1972
DOI: 10.1002/zaac.19723890112
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A procedure for determining the concentration of Hydroxyl Groups on Silica Surfaces

Abstract: By determining the concentration of D2O in D2O/H2O liquid mixtures, it has been possible to develop a method to obtain the concentration of hydroxyl groups on the surface of silica gel. The results of 4.4 ± 0.2 –OH groups per 100 Å2 of surface are in good agreement with the findings of other workers.

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Cited by 29 publications
(9 citation statements)
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“…Rather large samples were needed. Extinction at 2500 cm -1 has been used for the determination of relatively small quantities of HDO in exchange water [161]. The proportion of deuterated hydroxyl groups on a silica wafer which was in exchange equilibrium with the sample was determined from the intensity of the 2760 cm -1 absorption peak of OD groups by Davydov et al [162]; the total amount of OH groups was then estimated from the quantity of DzO introduced.…”
Section: Active Hydrogenmentioning
confidence: 99%
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“…Rather large samples were needed. Extinction at 2500 cm -1 has been used for the determination of relatively small quantities of HDO in exchange water [161]. The proportion of deuterated hydroxyl groups on a silica wafer which was in exchange equilibrium with the sample was determined from the intensity of the 2760 cm -1 absorption peak of OD groups by Davydov et al [162]; the total amount of OH groups was then estimated from the quantity of DzO introduced.…”
Section: Active Hydrogenmentioning
confidence: 99%
“…Deuterium exchange techniques (see also section II.B.1.a) are now preferred over other methods. Madely and Richmond [161] measured the OH group density indirectly by spectroscopically determining the D 2 0/ H 2 0 composition in liquid water, which was obtained after extensive D 2 0 exchange with silica surfaces and re-exchange with H 2 0. The value reported was 4.4 ± 0.2 OH nm -2 which very closely corresponds to the generally accepted value for the OH saturation coverage [3,52].…”
Section: Vibrational Spectroscopies A) Infrared Transmission-absorptimentioning
confidence: 99%
“…They were then copiously rinsed with deionized water, blown dry with nitrogen, and dried at 100°C under vacuum for 30 min. This cleaning procedure creates a surface rich in hydroxyl groups at the oxide surface to facilitate the subsequent silanization process [41,42].…”
Section: Substrate Preparationmentioning
confidence: 99%
“…This cleaning procedure creates a surface rich in hydroxyl groups at the oxide surface to facilitate the subsequent silanization process. [2][3] Assembly of aminosilane was performed as described elsewhere, 4 wherein the hydroxyl covered substrates were rinsed with toluene and then immersed in a 3 mM APhS solution in toluene for 2 h. Subsequently, the wafers were removed from the solution, rinsed and sonicated for 10 min with toluene, rinsed again with toluene and then with methanol, finally blown dry with nitrogen. The above-amine terminated substrates were immersed in a 0.5 % (w/v) THF solution of Gantrez for 1 h under nitrogen environment.…”
Section: Immobilization On Silicon Surfacementioning
confidence: 99%