A plane-grating monochromator beamline for the PTB undulators at BESSY II

Senf, F.; Flechsig, U.; Eggenstein, F.; Gudat, W.; Klein, R.; Rabus, Hans; Ulm, G.

doi:10.1107/s0909049597020323

Cited by 98 publications

(82 citation statements)

References 5 publications

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“…The spectral lines were analyzed in the same way as previously. The ratio Kβ 1,3 /Kα 1,2 was derived and found at 0.128 (13) and is presented with other results in Table 6.…”

Section: Resultssupporting

confidence: 64%

“…Monochromatized synchrotron radiation of high spectral purity was used for transmission measurements on three nickel foils with nominal thicknesses of 100 nm, 500 nm and 2 μm respectively. The measurements in the photon energy range between 390 eV and 1860 eV were performed at an undulator beamline equipped with a plane grating monochromator (PGM) [13]. One advantage of this beamline is the provision of high radiant power which is one to three orders of magnitude higher than the one of a typical bending magnet monochromator beamline.…”

Section: The X-ray Beamlines At the Ptb Laboratory At Bessy IImentioning

confidence: 99%

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Experimental determination of the x-ray atomic fundamental parameters of nickel

et al. 2017

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X-ray atomic properties of nickel were investigated in a singular approach that combines different experimental techniques to obtain new and useful reliable values of atomic fundamental parameters for X-ray spectrometric purposes and for comparison to theoretical predictions. We determined the mass attenuation coefficients in an energy range covering the L-and K-absorption edges, the K-shell fluorescence yield and the Kβ/Kα and Kβ 1,3/K α1,2 transition probability ratios. The obtained line profiles and linewidths of the Kα and Kβ transitions in Ni can be considered as the contribution of the satellite lines arising from the [KM] shake processes suggested by Deutsch et al. [1] and Ito et al. [2]. Comparison of the new data with several databases showed a good agreement but also discrepancies were found with existing tabulated values.

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“…The spectral lines were analyzed in the same way as previously. The ratio Kβ 1,3 /Kα 1,2 was derived and found at 0.128 (13) and is presented with other results in Table 6.…”

Section: Resultssupporting

confidence: 64%

Section: The X-ray Beamlines At the Ptb Laboratory At Bessy IImentioning

confidence: 99%

Experimental determination of the x-ray atomic fundamental parameters of nickel

et al. 2017

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“…All experiments for the FP determinations in this work were performed at beamlines [41,42] within the PTB laboratory at the BESSY II synchrotron radiation facility in Berlin [43]. The x-ray spectrometry group of PTB operates several XRF endstations [44,45], which are equipped with radiometrically calibrated instrumentation and thus allow for a reference-free quantitative XRF analysis [46].…”

Section: Methodsmentioning

confidence: 99%

Theoretical and experimental determination of K - and L -shell x-ray relaxation parameters in Ni

et al. 2018

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Fluorescence yields (FY) for the Ni K and L shells were determined by a theoretical and an experimental group within the framework of the International Initiative on X-ray Fundamental Parameters (FPs) collaboration. CosterKronig (CK) parameters were also measured for the L shell of Ni. Theoretical calculations of the same parameters were performed using the Dirac-Fock method, including relativistic and QED corrections. The experimental values for the FY and CK were determined at the PTB laboratory in the synchrotron radiation facility BESSY II, Berlin, Germany, and are compared to the corresponding calculated values.

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“…TXRF and NEXAFS experiments were carried out at the FCM (Four Crystal Monochromator) and PGM (Plane Grating Monochromator) beamlines 13 in the PTB laboratory at the synchrotron radiation facility BESSY II in Berlin. Employing well-characterized synchrotron radiation and calibrated detectors, the TXRF measurements allow for reference-free quantification of the amount of S. 14 The monochromatized radiation hits the vertically mounted samples under a grazing incidence angle below the angle of external total reflection.…”

Section: Methodsmentioning

confidence: 99%

Atomic Layer Deposition of High-κ Dielectrics on Sulphur-Passivated Germanium

Sioncke

Lin

Brammertz

et al. 2011

J. Electrochem. Soc.

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High mobility channels are currently being explored to replace the silicon channel in future CMOS technology nodes. However, until now the promising bulk properties are very difficult to translate into high transconductance due to a poor passivation of the interface between the gate dielectric and the channel. We have studied the S-passivation of the germanium surface combined with various high-permittivity dielectric gate stacks. (NH4)2S is used to achieve a S-terminated Ge surface. We found that the Ge/S/Al2O3 interface is superior to both the Ge/S/ZrO2 and Ge/S/HfO2 interfaces. Bi-layer stacks consisting of Ge/S/Al2O3/HfO2 or Ge/S/Al2O3/ZrO2 were built to achieve a gate stack with low EOT (Equivalent Oxide Thickness). In these bi-layer stacks, the Al2O3 thickness is reduced to a minimum without degradation of the interface properties. Rather thick Al2O3 interlayers (∼ 2 nm) are needed due to island growth on S-terminated Ge surface. A pMOSFET was built using a bi-layer gate stack (Ge/S/Al2O3/HfO2). The peak mobility of this device is > 200 cm2/Vs at an EOT of 1.5 nm.

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A plane-grating monochromator beamline for the PTB undulators at BESSY II

Cited by 98 publications

References 5 publications

Experimental determination of the x-ray atomic fundamental parameters of nickel

Experimental determination of the x-ray atomic fundamental parameters of nickel

Theoretical and experimental determination of K - and L -shell x-ray relaxation parameters in Ni

Atomic Layer Deposition of High-κ Dielectrics on Sulphur-Passivated Germanium

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