A numerical simulation of total reflection X-ray photoelectron spectroscopy (TRXPS)

Kawai, Jun; Takami, Michio; Fujinami, Masanori; Hashiguchi, Yoshihiro; Hayakawa, Shinjiro; Gohshi, Yohichi

doi:10.1016/0584-8547(92)80092-u

Cited by 49 publications

(22 citation statements)

References 43 publications

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“…The penetration depth of the incident x-rays τx is greatly reduced under the total reflection condition, and it can be calculated from the equations reported previously. 14 When the x-ray reflectivity is negligibly small, T(θ) becomes unity and τx becomes sin θ/μ where μ is the linear absorption coefficient of x-rays. Whenever τx is much greater than τe, the Eq.…”

Section: Theoreticalmentioning

confidence: 99%

“…The gain of the beam intensity is calculated from the interference of incident and reflected x-ray beams, 14 and it will have the maximum value at the critical angle of total reflection. The penetration depth of the incident x-rays τx is greatly reduced under the total reflection condition, and it can be calculated from the equations reported previously.…”

Section: Theoreticalmentioning

confidence: 99%

“…The calculations of x-ray reflectivity and penetration depth were made for a mirror polished Ni film of infinite thickness by using equations described previously. 14 The complex refractive indices n = 1 -δ -iβ for Cu Kα (8.04 keV) and Cu Kβ (8.90 keV) were derived from the tabulated complex atomic scattering factors. 15 Two interference fringes were observed in the reflectivity data from 7 to 10 mrad shown in Fig.…”

Section: Cey Under the Grazing Incidence Conditionmentioning

confidence: 99%

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Contribution of Ni KLL Auger Electrons to the Probing Depth of the Conversion Electron Yield Measurements

2010

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Section: Theoreticalmentioning

confidence: 99%

Section: Theoreticalmentioning

confidence: 99%

Section: Cey Under the Grazing Incidence Conditionmentioning

confidence: 99%

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Contribution of Ni KLL Auger Electrons to the Probing Depth of the Conversion Electron Yield Measurements

2010

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“…One of the possible methods to increase the sensitivity of XPS is to use the total reflection phenomenon of the incident X-rays. The method is called total reflection XPS (TR-XPS) [11,12]. In TR-XPS, a sample surface is irradiated by X-rays at grazing incidence whose glancing angle is below the critical angle of the total reflection.…”

Section: Introductionmentioning

confidence: 99%

Interaction between Ultra-Trace Amount of Cesium and Oxides Studied by Total-Reflection X-Ray Photoelectron Spectroscopy

Baba

Shimoyama

Hirao

et al. 2015

e-J. Surf. Sci. Nanotech.

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In order to clarify the chemical states of radioactive cesium sorbed in minerals such as clay, soil, sand and rock, X-ray photoelectron spectra (XPS) have been measured for cesium adsorbed on SiO2 and Al2O3 (sapphire), which are major components of these minerals. Since the number of atoms in radioactive cesium ( 134 Cs or 137 Cs) is extremely small, total reflection XPS (TR-XPS) using synchrotron radiation was applied in order to measure trace amount of cesium. For SiO2 surface, it was shown that ultra-trace amount of cesium down to 205 pg·cm −2 can be detected by TR-XPS. This amount corresponds to about 400 Bq of 137 Cs (t 1/2 =30.2 y). Thus it was demonstrated that the ultra-trace amount of cesium corresponding to the radioactive cesium level can be measured by TR-XPS. As to the chemical states of cesium, the binding energy of the Cs 3d 5/2 line for cesium adsorbed on SiO2 and Al2O3 ranges from 725.2 eV to 725.5 eV irrespective of the adsorption conditions, suggesting that the cesium is adsorbed through weak Van-der-Waals force. While after rinsing the cesium-adsorbed SiO2 in water, the binding energy of the Cs 3d 5/2 line shifted by 0.8 eV to higher energy side. The result indicates that the ultra-trace amount cesium remaining after rinsing is covalently bonded with the SiO2 surface rather than ionically bonded.

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“…It is found from this figure that the background of the TRXPS is proven to be reduced, as predicted in ref. 19. A comparison between Tougaard's background formula20 and the experimental TRXPS makes it possible to determine the inelastic mean free path of a particular kinetic energy electron in a solid.…”

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confidence: 99%

X-Ray Absorption and Photoelectron Spectroscopies Using Total Reflection X-Rays

et al. 1995

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A numerical simulation of total reflection X-ray photoelectron spectroscopy (TRXPS)

Cited by 49 publications

References 43 publications

Contribution of Ni KLL Auger Electrons to the Probing Depth of the Conversion Electron Yield Measurements

Contribution of Ni KLL Auger Electrons to the Probing Depth of the Conversion Electron Yield Measurements

Interaction between Ultra-Trace Amount of Cesium and Oxides Studied by Total-Reflection X-Ray Photoelectron Spectroscopy

X-Ray Absorption and Photoelectron Spectroscopies Using Total Reflection X-Rays

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