2016 13th China International Forum on Solid State Lighting (SSLChina) 2016
DOI: 10.1109/sslchina.2016.7804338
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A novel surface treatment for the sliver ohmic contacts to P-GaN

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“…Furthermore, the peak electric field at the edges can be reduced by extension of PN junction in depletion layer. However, the p + -GaN implantation method with high-temperature annealing conditions can increase the significant risk and complexity of the p-guard ring fabrication [52][53][54][55][56][57][58].…”
Section: Field Ringsmentioning
confidence: 99%
“…Furthermore, the peak electric field at the edges can be reduced by extension of PN junction in depletion layer. However, the p + -GaN implantation method with high-temperature annealing conditions can increase the significant risk and complexity of the p-guard ring fabrication [52][53][54][55][56][57][58].…”
Section: Field Ringsmentioning
confidence: 99%