2009 52nd IEEE International Midwest Symposium on Circuits and Systems 2009
DOI: 10.1109/mwscas.2009.5235967
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A novel design methodology to optimize the speed and power of the CNTFET circuits

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Cited by 69 publications
(56 citation statements)
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“…The distance between the centers of two adjacent CNTs below the same gate of a CNTFET is called Pitch, which has a direct impact on the width of the contacts and the gate of the transistor. The width of the gate of a CNTFET can be calculated based on the following equation [8]:…”
Section: Carbon Nanotube Field Effect Transistors (Cnfets)mentioning
confidence: 99%
“…The distance between the centers of two adjacent CNTs below the same gate of a CNTFET is called Pitch, which has a direct impact on the width of the contacts and the gate of the transistor. The width of the gate of a CNTFET can be calculated based on the following equation [8]:…”
Section: Carbon Nanotube Field Effect Transistors (Cnfets)mentioning
confidence: 99%
“…The dielectric layer under the gate is deposited on the undoped CNTs (in the middle), and the metal gate layer covers it [18]. Single-wall CNT partitions between the gate and the drain and source are heavily doped to provide low resistors in a serial state whenever the transistor is in its active mode, as shown in Fig. 1 [18], [32]. The CNTFETs switch between active mode and inactive mode by manipulating the electrical potential of the gate.…”
Section: Cntfet Reviewmentioning
confidence: 99%
“…The CNTFETs switch between active mode and inactive mode by manipulating the electrical potential of the gate. In reports on CNTFET fabrication, it was declared that a near-ballistic [23] or even ballistic transportation can be gained from an intrinsic CNT under low voltage with an approximately 1 micrometer mean free path needed for elastic scattering to obtain efficient improvement in performance [32]- [34]. The fabrication of single-wall CNT (SWCNT) transistors was reported in [18], [35].…”
Section: Cntfet Reviewmentioning
confidence: 99%
“…Second, it is also possible to reutilize CMOS fabrication process. The last but not the least is that CNFET has the best experimentally demonstrated device current carrying ability up to now [14].…”
Section: A Technology Constraintsmentioning
confidence: 99%