2006
DOI: 10.1002/pssc.200671592
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A novel approach for the growth of InGaN quantum dots

Abstract: A novel two-step growth method for creating InGaN quantum dots (QDs) was developed by using a combination of an In x Ga 1-x N nucleation layer with a platelet structure and an In y Ga 1-y N formation layer with an indium content lower than that of the In x Ga 1-x N nucleation layer. The realized QDs were investigated by micro-photoluminescence measurements. We observed sharp emission lines at 4 K with a spectral width down to the spectral resolution limit of the experimental setup of 0.17 meV. This growth conc… Show more

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Cited by 21 publications
(25 citation statements)
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“…In addition, TEM analyses indicated the onset of InGaN island dissolution. These problems were overcome by development of a new growth technique for InGaN quantum dot formation [44], where an InGaN nucleation layer of 1-2 nm thickness and nominal concentration of 0.4 is stabilised by an InGaN formation layer of about 7 nm thickness and nominal concentration of 0.1. The capped structure exhibits quantum dot luminescence [45], and TEM analysis revealed that the quantum dot emission most probably stems from indium rich regions with diameters of $5 nm [46].…”
Section: Discussionmentioning
confidence: 99%
“…In addition, TEM analyses indicated the onset of InGaN island dissolution. These problems were overcome by development of a new growth technique for InGaN quantum dot formation [44], where an InGaN nucleation layer of 1-2 nm thickness and nominal concentration of 0.4 is stabilised by an InGaN formation layer of about 7 nm thickness and nominal concentration of 0.1. The capped structure exhibits quantum dot luminescence [45], and TEM analysis revealed that the quantum dot emission most probably stems from indium rich regions with diameters of $5 nm [46].…”
Section: Discussionmentioning
confidence: 99%
“…The InGaN is deposited on a GaN buffer at a temperature of 700 °C for which formation of QD structures is theoretically expected. The InGaN QD structure is capped by GaN with a thickness of 30 nm the growth temperature is increased up to 820 °C (for growth details see [11]). Morphological information on the QD structures will be achieved in future by transmission electron microscopy investigations.…”
Section: Introductionmentioning
confidence: 99%
“…[41,42] A microphotoluminescence (m-PL) setup has been used employing a microscope objective to excite nonresonantly individual mesa structures with a continuous-wave (325 nm) or pulsed laser system (350 nm) and to collect their emission at variable temperatures (the measurements were performed at 4 K unless otherwise stated). The PL emission was detected either by a liquid-nitrogen cooled charged-coupled device camera or a multichannel plate after dispersion in a monochromator.…”
Section: Methodsmentioning
confidence: 99%