1988
DOI: 10.1116/1.575287
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A new technique for characterization of thin-film ferroelectric memory devices

Abstract: Articles you may be interested inHigh speed, nondestructive readout from thinfilm ferroelectric memory

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Cited by 17 publications
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“…Phase III always reverted back to phase II, but the rate at which this process occurred was strongly affected by the tem-perature of the specimen [16][17][18]. Phase III structure, which is ferroelectric, can be applied ferroelectric memory devices [19][20][21][22]. Ferroelectric phase III of KNO 3 arises from a small shift of 0.55 Å of the nitrate groups along the c-axis from the centre of the unit cell, which creates a dipole moment.…”
Section: Materials and Its Propertiesmentioning
confidence: 99%
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“…Phase III always reverted back to phase II, but the rate at which this process occurred was strongly affected by the tem-perature of the specimen [16][17][18]. Phase III structure, which is ferroelectric, can be applied ferroelectric memory devices [19][20][21][22]. Ferroelectric phase III of KNO 3 arises from a small shift of 0.55 Å of the nitrate groups along the c-axis from the centre of the unit cell, which creates a dipole moment.…”
Section: Materials and Its Propertiesmentioning
confidence: 99%
“…The scientific interest in potassium nitrate as a ferroelectric material is due to the attractive large signals that indicate the switching properties of its thin films form [19][20][21][22]. The square hysteresis loop, low switching potential (≤5 V), and fast switching times (≥20 ns) of KNO 3 thin films make them promising as a permanent storage medium in large scale integrated ferroelectric random access memories (Fe-RAMs) [6].…”
Section: Materials and Its Propertiesmentioning
confidence: 99%
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