1997
DOI: 10.1007/bf02916944
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Leakage behavior and distortion of the hysteresis loop in ferroelectric thin films

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Cited by 7 publications
(3 citation statements)
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“…The average resistivity values calculated from repeated experiments are provided in figure 5(b). The complete relationship of leakage current to applied electric field is a combination of a linear regime at intermediate electric fields and nonlinear regimes at low and high electric fields [35]. The resistivity is exponentially decreasing with increased temperature, in agreement with previously reported results [36].…”
Section: Leakage Current Measurementsupporting
confidence: 91%
“…The average resistivity values calculated from repeated experiments are provided in figure 5(b). The complete relationship of leakage current to applied electric field is a combination of a linear regime at intermediate electric fields and nonlinear regimes at low and high electric fields [35]. The resistivity is exponentially decreasing with increased temperature, in agreement with previously reported results [36].…”
Section: Leakage Current Measurementsupporting
confidence: 91%
“…Non-symmetric P(E) hysteresis loops observed on both bulk ceramics and thin films are generally attributed to internal fields caused by spacecharge accumulation and to the influence of the film-substrate interface and to grain boundary phenomena [36,37]. Although the non-linearity P(E) features demonstrated ferroelectric properties of these thin films, due to the resistive leakage, it is impossible to appreciate their macroscopic switching performances.…”
Section: Resultsmentioning
confidence: 97%
“…Figure 4 shows the leakage current density versus electric field (𝐽 − 𝐸) characteristics of the Au/BSFO/LNO film capacitors measured at RT. 𝐽 − 𝐸 curves of all the films at negative and positive biases are asymmetric, according to the report of Clark et al [21] and Zheng et al; [22] this may originate from the different work functions of Au and LNO electrodes. As shown in the figures, the leakage current density of the films first increases with 𝑥 increasing to 0.03, and then it decreases with 𝑥 increasing to 0.10.…”
mentioning
confidence: 59%