1994
DOI: 10.1016/0040-6090(94)90059-0
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A new route for the deposition of SiO2 sol-gel coatings

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Cited by 28 publications
(10 citation statements)
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“…It was previously shown that a large range of solutions and deposition conditions could be flexibly used for the deposition of homogeneous and dense SiO2 thin films [2]. However, in the course of our investigations some experimental conditions were also observed to lead to undesirable morphology features such as film roughness or local thickness inhomogeneities.…”
Section: Introductionmentioning
confidence: 66%
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“…It was previously shown that a large range of solutions and deposition conditions could be flexibly used for the deposition of homogeneous and dense SiO2 thin films [2]. However, in the course of our investigations some experimental conditions were also observed to lead to undesirable morphology features such as film roughness or local thickness inhomogeneities.…”
Section: Introductionmentioning
confidence: 66%
“…The solution preparation and deposition device were described elsewhere [2]. Deposition experiments were carried out using a horizontal deposition chamber.…”
Section: Methodsmentioning
confidence: 99%
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“…It also appears that the use of high surface tension and viscosity liquids decreases the production yield. Typically, a liquid viscosity below 10 cP is preferable to reach acceptable pulverization yields (Marage et al 1994a). Rheological properties of the sol drastically evolve during sol-gel reaction in liquid phase.…”
Section: Aerosol-gel Coating Technology Process Descriptionmentioning
confidence: 99%