2004
DOI: 10.1109/tns.2004.832547
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A new oxide-trap based on charge-pumping (OTCP) extraction method for irradiated MOSFET devices: part II (low frequencies)

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Cited by 24 publications
(2 citation statements)
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“…For instance, Sun et al [9] investigated that GaN HEMTs which are with Schottky metallic gate structures typically exhibit a small shift after TID irradiation, while GaN HEMTs with MOS gates exhibit additional threshold voltage shift compared to similar devices with Schottky gates because of hole trapped in the gate oxide. Lidow et al [10] have studied the E-mode Schottky gate devices and concluded that the devices exhibited drifts of ∼0.2 V. Ives et al [11] have investigated the commercial radio frequency (RF) D-mode Schottky gate power HEMTs and indicated that the devices exhibited shifts of about 0.15 V. On the other hand, although significant progress has been made in understanding the underlying physics of TID irradiation in the Si MOSFETs [12][13][14][15][16][17][18][19], there is not much work undertaken on the TID effects in the Cascode GaN HEMTs. Chen et al [20] have investigated the high and low dose-rate radiation damage effects of the Cascode structure GaN power devices and found that the threshold voltage of the Cascode device was negatively drifted, having no enhanced low dose rate sensitivity effect.…”
Section: Introductionmentioning
confidence: 99%
“…For instance, Sun et al [9] investigated that GaN HEMTs which are with Schottky metallic gate structures typically exhibit a small shift after TID irradiation, while GaN HEMTs with MOS gates exhibit additional threshold voltage shift compared to similar devices with Schottky gates because of hole trapped in the gate oxide. Lidow et al [10] have studied the E-mode Schottky gate devices and concluded that the devices exhibited drifts of ∼0.2 V. Ives et al [11] have investigated the commercial radio frequency (RF) D-mode Schottky gate power HEMTs and indicated that the devices exhibited shifts of about 0.15 V. On the other hand, although significant progress has been made in understanding the underlying physics of TID irradiation in the Si MOSFETs [12][13][14][15][16][17][18][19], there is not much work undertaken on the TID effects in the Cascode GaN HEMTs. Chen et al [20] have investigated the high and low dose-rate radiation damage effects of the Cascode structure GaN power devices and found that the threshold voltage of the Cascode device was negatively drifted, having no enhanced low dose rate sensitivity effect.…”
Section: Introductionmentioning
confidence: 99%
“…This method is derived from oxide-trap charge-pumping (OTCP) method, developed for radiation effect. 11,12) It can give further information on the behavior of NBTI-induced interface and oxide traps.…”
Section: Introductionmentioning
confidence: 99%