2006
DOI: 10.1007/s00604-006-0559-0
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A New Method of Surface Preparation for High Spatial Resolution EPMA/SEM with an Argon Ion Beam

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Cited by 31 publications
(25 citation statements)
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“…Polishing of the crosssection was performed on a Jeol SM09010 CSP with an Argon ion beam at 5 kV. [15] …”
Section: Amplifi Ed Spontaneous Emission From Ve-pfo and Pfo Films Anmentioning
confidence: 99%
“…Polishing of the crosssection was performed on a Jeol SM09010 CSP with an Argon ion beam at 5 kV. [15] …”
Section: Amplifi Ed Spontaneous Emission From Ve-pfo and Pfo Films Anmentioning
confidence: 99%
“…First, early experiments demonstrated the potential for achieving submicrometer grains in this alloy by HPT processing [18,19]. Second, this alloy responds well to preparation using ion beam cross-sectional polishing [20] and it is therefore possible to produce wide areas for inspection using scanning electron microscopy (SEM). Furthermore, and as demonstrated in a recent report [21], this procedure may be used for grain size determinations because the ion-polished surfaces provide very clear images of the grain boundaries in the SEM with enhanced electron channeling contrast.…”
Section: Introductionmentioning
confidence: 99%
“…Then the prepolished surfaces were Ar ion milled for 12–15 h under an accelerating voltage of 5 kV and an ion beam current of 0.1 mA using a JEOL SM‐09010 cross‐section polisher (Jeol Ltd., Tokyo, Japan). By ion milling, an approximately 50‐μm‐thick layer is removed from the mechanically prepolished surface, and an area of a few millimeter square of the underlying material is exposed without mechanical impact 13,14 . Shorter ion‐milling times of a few hours are applicable to achieve a slightly smaller polished area.…”
Section: Methodsmentioning
confidence: 99%