A new layer system of anti-reflective coating for cathode ray tubes

Oyama, Takuji; Ohsaki, Hisashi; Tachibana, Yuta; Hayashi, Yasuo; Ono, Yusuke; Horie, Noritoshi

doi:10.1016/s0040-6090(99)00214-x

Cited by 34 publications

(10 citation statements)

References 3 publications

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“…Recently, interest in titanium oxynitride films has increased and have been extensively studied due to their improved physical and chemical properties, which mainly depend on their N/O ratio. Oxygen-rich TiN x O y films have been used as insulating layer in metal-insulator-metal (MIM) capacitive structures to avoid interfacial oxide layer formation [11], while nitrogen-rich TiN x O y films have been used as an excellent diffusion barrier layer for semiconductor applications [12]; Additionally, many other useful applications of TiN x O y films, such as anti-reflective coating [13] and biomaterials [14] solar selective absorbers [15] and wearresistant coatings [16], have been demonstrated. The wettability studies to determine hydrophilic or hydrophobic nature of titanium oxynitride film are the area that is unexplored and no literature has been found regarding the investigation of this property so far.…”

Section: Introductionmentioning

confidence: 99%

RETRACTED ARTICLE: Structural and electrochemical impedance spectroscopic studies on reactive magnetron sputtered titanium oxynitride (TiON) thin films

Padmavathy¹,

Subramanian

Ravidhas³

et al. 2011

J Appl Electrochem

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Titanium oxynitride films were deposited onto commercially pure titanium substrates by direct current reactive magnetron sputtering method using Ti targets and an Ar-N 2 -O 2 mixture discharge gas. The X-ray photoelectron spectroscopy survey spectra on the etched surfaces of TiON films exhibited the characteristic Ti 2p, N 1s, and O 1s peaks at the corresponding binding energies 454.5, 397.0, and 530.7 eV, respectively. The surface topography of these coatings was studied using atomic force microscopy. The characteristic Raman peaks at 200 and 641 cm -1 for the TiN bonds and at 148, 398 ,and 518 cm -1 for the TiO 2 bonds were observed from the Laser Raman spectrometer. The potentiodynamic polarization studies in simulated bodily fluid were performed and the results are reported in this article.

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Section: Introductionmentioning

confidence: 99%

RETRACTED ARTICLE: Structural and electrochemical impedance spectroscopic studies on reactive magnetron sputtered titanium oxynitride (TiON) thin films

Padmavathy¹,

Subramanian

Ravidhas³

et al. 2011

J Appl Electrochem

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“…They showed that the nitrogen content in the film increases as the growth temperature increases and films deposited on Si (100) exhibit a shift of diffraction peaks to higher Bragg angles. Nevertheless, potential applications of titanium oxynitride films as anti-reflecting coatings [14] and as optically selective absorbing coatings and transparent IR window electrodes [15,16], require further systematic investigations of the growth and the resulting properties of this material.…”

Section: Introductionmentioning

confidence: 99%

Influence of nitrogen content on properties of direct current sputtered TiOxNy films

Mohamed

Kappertz

Ngaruiya

et al. 2004

phys. stat. sol. (a)

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The deposition of optical functional coatings with large rates yet also high refractive index and excellent transparency over a wide spectral range is of paramount importance for many applications. In this study we will demonstrate that TiO x N y films can meet these requirements. The films were deposited by reactive dc magnetron sputtering from a metallic titanium target. The sputtering atmosphere consisted of both Ar as well as oxygen and nitrogen. The starting oxygen partial pressure was 1.14 × 10 -1 Pa which corresponds to the oxidic mode of the Ti target. Then oxygen was being replaced stepwise by nitrogen. Even for high nitrogen partial pressures, only a very small amount of nitrogen incorporation in the films was observed by Rutherford Backscattering Spectroscopy and Secondary Neutral Mass Spectroscopy. This result was compared with simulations based upon thermodynamics, which however showed a significant deviation from experiment that could be explained incorporating kinetic aspects. X-ray reflectometry showed that the density and the deposition rate increase with increasing nitrogen partial pressure. X-ray diffraction revealed that the amount of incorporated oxygen tailors the crystal structure of the TiO x N y films. The optical properties were measured using optical spectroscopy and spectroscopic ellipsometry. The optical band gap was found to decrease from 3.29 to 2.11 eV with increasing nitrogen content in the sputtering gas, while the refractive index was found to increase by 15%. The detected intrinsic stresses in TiO x N y were compressive and had values similar to titanium oxide.

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“…In contrast to single-, double- or multilayer ARCs which are made of lossless dielectrics (negligible extinction at operational wavelengths), absorbing layers have also been used for reduction of reflections. There, the reflection reduction not only originates from phase contrast and destructive interference, but the attenuation of the light passing through the absorbing film also contributes to the reduction [ 110 , 111 , 112 , 113 , 114 , 115 , 116 , 117 , 118 , 119 , 120 ].…”

Section: Unconventional Arcsmentioning

confidence: 99%

Antireflective Coatings: Conventional Stacking Layers and Ultrathin Plasmonic Metasurfaces, A Mini-Review

2016

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Reduction of unwanted light reflection from a surface of a substance is very essential for improvement of the performance of optical and photonic devices. Antireflective coatings (ARCs) made of single or stacking layers of dielectrics, nano/microstructures or a mixture of both are the conventional design geometry for suppression of reflection. Recent progress in theoretical nanophotonics and nanofabrication has enabled more flexibility in design and fabrication of miniaturized coatings which has in turn advanced the field of ARCs considerably. In particular, the emergence of plasmonic and metasurfaces allows for the realization of broadband and angular-insensitive ARC coatings at an order of magnitude thinner than the operational wavelengths. In this review, a short overview of the development of ARCs, with particular attention paid to the state-of-the-art plasmonic- and metasurface-based antireflective surfaces, is presented.

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A new layer system of anti-reflective coating for cathode ray tubes

Cited by 34 publications

References 3 publications

RETRACTED ARTICLE: Structural and electrochemical impedance spectroscopic studies on reactive magnetron sputtered titanium oxynitride (TiON) thin films

RETRACTED ARTICLE: Structural and electrochemical impedance spectroscopic studies on reactive magnetron sputtered titanium oxynitride (TiON) thin films

Influence of nitrogen content on properties of direct current sputtered TiOxNy films

Antireflective Coatings: Conventional Stacking Layers and Ultrathin Plasmonic Metasurfaces, A Mini-Review

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