2009
DOI: 10.1063/1.3097185
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A new instrument for thermal electron attachment at high temperature: NF3 and CH3Cl attachment rate constants up to 1100 K

Abstract: A new high temperature flowing afterglow Langmuir probe (HT-FALP) apparatus is described. A movable Langmuir probe and a four-needle reactant gas inlet were fitted to an existing high temperature flowing afterglow apparatus. The instrument is suitable for study of electron attachment from 300-1200 K, the upper limit set to avoid softening of the quartz flow tube. We present results for two reactions over extended ranges: NF(3) (300-900 K) and CH(3)Cl (600-1100 K). Electron attachment rate constants for NF(3) h… Show more

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Cited by 20 publications
(19 citation statements)
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“…They were typical of SIFT instruments of the day, being very large and heavy, following the precedence of the early flowing afterglow instruments (Ferguson, Fehsenfeld, & Schmeltekopf, 1969;Dunkin et al, 1968, Smith et al, 1975Adams & Smith, 1976), which surprisingly is still followed today when new laboratory research flow tube instruments are built (Van Doren et al, 2008;Miller et al, 2009). The flow tube was about a meter long and 8 cm diameter.…”
Section: A the Large Laboratory Sift-ms Instrumentmentioning
confidence: 97%
“…They were typical of SIFT instruments of the day, being very large and heavy, following the precedence of the early flowing afterglow instruments (Ferguson, Fehsenfeld, & Schmeltekopf, 1969;Dunkin et al, 1968, Smith et al, 1975Adams & Smith, 1976), which surprisingly is still followed today when new laboratory research flow tube instruments are built (Van Doren et al, 2008;Miller et al, 2009). The flow tube was about a meter long and 8 cm diameter.…”
Section: A the Large Laboratory Sift-ms Instrumentmentioning
confidence: 97%
“…The reader is referred to prior publications for further details on these instruments, with brief descriptions given here [19][20][21][22].…”
Section: Methodsmentioning
confidence: 99%
“…[11][12][13] One apparatus was a conventional FALP apparatus normally used in the 300-550 K temperature range. 11,12 The second apparatus was a high-temperature FALP (HT-FALP, 300-1200 K).…”
Section: Experimental Technique and Resultsmentioning
confidence: 99%