2016
DOI: 10.1103/physreva.93.032706
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Electron attachment to the interhalogen compounds ClF, ICl, and IBr

Abstract: Thermal electron attachment rate coefficients for three interhalogen compounds (ClF, ICl, IBr) have been measured from 300 to 900 K at pressures of 1-2 Torr using a flowing afterglow-Langmuir probe apparatus. ClF attaches somewhat inefficiently (k = 7.5×10 −9 cm 3 s −1 ) at 300 K, with the rate coefficient rising to 1.7×10 −8 cm 3 s −1 at 700 K. At higher temperatures the apparent rate coefficient falls steeply; however, this is interpreted as an artifact due to decomposition on the walls of the inlet line. IC… Show more

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Cited by 8 publications
(14 citation statements)
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“…(9) do not differ substantially from those obtained in Ref. [25] based on the approximation for the capture amplitude, Eq. (1).…”
Section: Results For Cross Sectionssupporting
confidence: 54%
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“…(9) do not differ substantially from those obtained in Ref. [25] based on the approximation for the capture amplitude, Eq. (1).…”
Section: Results For Cross Sectionssupporting
confidence: 54%
“…It is known, however, that the Bardsley correction can underestimate DEA cross sections that were indeed observed in Ref. [25]. Moreover, our calculations have shown that the choice a l = l + 1/2 produces cross sections which are substantially smaller than those calculated in Ref.…”
Section: Results For Cross Sectionsmentioning
confidence: 40%
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