2018
DOI: 10.1016/j.nima.2018.02.040
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A nanofabricated wirescanner with free standing wires: Design, fabrication and experimental results

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Cited by 4 publications
(3 citation statements)
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“…At FERMI, the WS nano-fabrication strategy was different. A first WS prototype consisting of a 10 µm wide Ag/Si 3 N 4 /Ag stripe free-standing onto a Silicon frame was initially nano-fabricated and tested at FERMI [14]. Finally, an upgrade of the previous free-standing WS solution consisting of a 0.8 mm long and 900 nm wide Au/Si 3 N 4 /Au stripe has been produced at FERMI, see fig.…”
Section: B Nano-fabricated Wire-scanners: First Developmentsmentioning
confidence: 99%
See 1 more Smart Citation
“…At FERMI, the WS nano-fabrication strategy was different. A first WS prototype consisting of a 10 µm wide Ag/Si 3 N 4 /Ag stripe free-standing onto a Silicon frame was initially nano-fabricated and tested at FERMI [14]. Finally, an upgrade of the previous free-standing WS solution consisting of a 0.8 mm long and 900 nm wide Au/Si 3 N 4 /Au stripe has been produced at FERMI, see fig.…”
Section: B Nano-fabricated Wire-scanners: First Developmentsmentioning
confidence: 99%
“…In order to improve the WS spatial resolution, new fabrication techniques are under investigation at PSI and FERMI. At PSI, a WS prototype with a sub-micrometer resolution nano-fabricated on-amembrane (250 nm thick Silicon Nitride membrane) was successfully tested [13]; while at FERMI a free-standing nanofabricated WS with a resolution of about 10 µm has been successfully tested [14]. These experiences paved the way to use the nano-litography technique to fabricate free-standing WS with sub-micrometer resolution, a goal that PSI and FERMI have independently pursued.…”
Section: Introductionmentioning
confidence: 99%
“…[15,16]) (speed of scan up to 20 m/s). Note the trend in the development of wire scanners with very short wires using nanofabrication technologies, designed to measure beams with sizes smaller than a few hundred microns [17,18]. Instead of measuring the flow of the scattered particles from the wire, a method has been developed to measure the secondary current generated by electron emission from the wire (see [10,11] for an introduction to the method).…”
Section: Introductionmentioning
confidence: 99%