2013 IEEE International Electron Devices Meeting 2013
DOI: 10.1109/iedm.2013.6724623
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A multi-wavelength 3D-compatible silicon photonics platform on 300mm SOI wafers for 25Gb/s applications

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Cited by 64 publications
(34 citation statements)
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“…High responsivity and high speed operation have been demonstrated for these structures and Ge waveguide detectors are now considered as mature devices ready for production 15 . However, their sensitivity still remains low, about À 21 dBm at 14 Gbit per second (Gbps) and bit-error-rate (BER) of 10 À 12 for Ge p-i-n photodiode 16 .…”
mentioning
confidence: 99%
“…High responsivity and high speed operation have been demonstrated for these structures and Ge waveguide detectors are now considered as mature devices ready for production 15 . However, their sensitivity still remains low, about À 21 dBm at 14 Gbit per second (Gbps) and bit-error-rate (BER) of 10 À 12 for Ge p-i-n photodiode 16 .…”
mentioning
confidence: 99%
“…Besides third window wavelengths (1490nm and 1550nm), the platform includes optical devices operating in the second window (1310nm), thus allowing backward compatibility with existing and emerging IEEE802.3 Ethernet standards. Integrated high speed Germanium photodiodes and phase modulators feature bandwidths in excess of 20GHz and 45GHz, respectively [3]. A TEM crosssection of the integrated Germanium photodiode used in the 25Gbps receiver demonstrator is shown in Fig.…”
Section: IImentioning
confidence: 99%
“…The photodiode has a 0.88A/W responsivity and a bandwidth >20GHz under 1V reverse bias, with a dark current of 100nA at 50°C. Input light is vertically coupled by means of polarization splitting grating couplers [3].…”
Section: IIImentioning
confidence: 99%
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“…Among the existing geometries, rib waveguide architectures are usually chosen to leverage industrial fabrication of advanced silicon based telecom and datacom photonic integrated circuits (PICs) [1][2]. The reason for this is that passive and active photonic components can readily be patterned with a single shallow-etch step using current complementary-metal-oxide-semiconductor (CMOS) fabrication techniques.…”
Section: Introductionmentioning
confidence: 99%