Thermally evaporated polycrystalline lead selenide was used to make detector arrays on high-resistivity Si substrates, for use as infrared photodetectors in the 3-5 µm range. The arrays were made using standard photolithographic methods and a process fully compatible with the technologies used in the microelectronics industry. After activation at high temperature in an O 2 + I atmosphere, excellent uniformity and room-temperature peak detectivities up 10 9 cm Hz 1/2 W −1 were obtained. The spectral response at 273 K of the detectors went up to 5 µm, with peak responsivity of 7 × 10 3 V W −1 at 4.1 µm. These arrays have been used to develop compact gas sensors with the addition of integrated bandpass multilayer optical filters.