1999
DOI: 10.1063/1.124496
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A monolithic field-effect-transistor-amplified magnetic field sensor

Abstract: We propose and demonstrate the operation of a monolithic field-effect-transistor-amplified magnetic field sensor device, in which a tunnel-magnetoresistive ͑TMR͒ material is incorporated within the gate of a Si metal-oxide-semiconductor-field-effect transistor. A fixed voltage is applied across the TMR layer, which leads charge to build up within the gate. Applying or changing an external magnetic field causes a change in the charge within the TMR layer and, consequently, a shift in the transistor threshold vo… Show more

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Cited by 3 publications
(2 citation statements)
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References 8 publications
(7 reference statements)
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“…The detailed device fabrication process is given in Ref. 8. Previous reports have shown that the Co/SiO 2 film deposited under these conditions consists of Co clusters with an average diameter of about 4 nm embedded in a SiO 2 matrix.…”
Section: Design and Fabricationmentioning
confidence: 99%
See 1 more Smart Citation
“…The detailed device fabrication process is given in Ref. 8. Previous reports have shown that the Co/SiO 2 film deposited under these conditions consists of Co clusters with an average diameter of about 4 nm embedded in a SiO 2 matrix.…”
Section: Design and Fabricationmentioning
confidence: 99%
“…Specifically, the observation of charge storage with retention times of up to several minutes in discontinuous magnetic metal/insulator multilayer structures 7 led to the design and demonstration of a novel monolithic field-effect-transistor-amplified magnetic field sensor. 8 In this device, a granular tunnel-magnetoresistive ͑TMR͒ thin film was incorporated within the gate structure of a p-channel metal-oxide-semiconductor field-effect transistor ͑MOSFET͒. The design allows for relatively simple fabrication and monolithic integration with other semiconductor components for increased sensitivity and functionality.…”
Section: Introductionmentioning
confidence: 99%