A molecular model for correlating vapor-liquid equilibrium of propane+hydrocarbon mixtures

Faúndez, Claudio A.; Tamblay, L.; Valderrama, José O.

doi:10.1007/bf02719494

Cited by 2 publications

(1 citation statement)

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“…Self-consistent fluid models have been used to simulate silane plasma [12][13][14][15], and the model presented in this article is a self-consistent fluid model. Due to the discharge processes, silane is consumed and hydrogen is dissociated, the composition of the background gas is different form the feedstock gas and is chiefly made of neutrals, ions, and electrons.…”

Section: One-dimensional Fluid Modelmentioning

confidence: 99%

Effects of silyl concentration, hydrogen concentration, ion flux, and silyl surface diffusion length on microcrystalline silicon film growth

Wen

Zhang

et al. 2008

Korean J. Chem. Eng.

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Two sets of μc-Si : H films as a function of pressure were fabricated by very-high-frequency plasma enhanced chemical vapor deposition (VHF-PECVD). Deposition rate, Raman crystallinity, and photo/dark conductivity were investigated under both low and high power conditions. A plasma fluid model and a surface hydride-dependent precursor diffusion model were constructed to understand the evolution of microcrystalline silicon under low and high power conditions. Silyl, hydrogen, ion flux, silyl surface diffusion length are believed to have much influence on film growth rate, crystallinity and photo electronic properties. But the interesting point is that under a certain condition one or more of these parameters dominate μc-Si : H growth, while other parameters have weak influence. Short-life radicals are found to be the possible major factor on the deterioration of photo sensitivity of μc-Si : H films.

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Section: One-dimensional Fluid Modelmentioning

confidence: 99%