A modular bipolar power supply for high-power ion-plasma installations

Abstract

The circuitry solutions, design, and main parameters of a modular pulse bipolar power supply unit for high power ion plasma facilities are described. The modular principle of designing power supplies provided their application in various processes. The results of tests of the developed device as the power supply of a magnetron sputtering system with a power of 60 kW and a high voltage power supply of the substrate bias voltage with a power of up to 40 kW are presented. The efficiency of applying bipolar pulses for preventing arcing at the magnetron cathode is experimentally demonstrated.

Magnetron deposition of yttria-stabilised zirconia electrolyte for solid oxide fuel cells

“…Over the past years, the greatest changes have occurred in the magnetron power supplies. Previously, the most frequently used were DC, unipolar pulsed, bipolar pulsed [22] and dual magnetron sputtering systems. Now, high power impulse magnetron sputtering (HiPIMS) [23] and deep oscillation magnetron sputtering (DOMS) [24] are becoming increasingly popular.…”

Power supply output inductance effect on arc parameters of high-power impulse magnetron sputtering

“…The size and number of microdroplets depend on many parameters, including the arc energy. Up-to-date power sources of the magnetron sputtering systems can limit the arc energy to a few units or even fractions of mJ, which allows avoiding the defect formation [1][2][3][4]. Such a low arc energy is much more difficult to provide during the high-power impulse magnetron sputtering (HIPIMS) process.…”