Influence of deposition conditions on mechanical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method

Grenadyorov, A. S.; Solovyev, A. A.; Оскомов, К. В.; Сыпченко, В. С.

doi:10.1016/j.surfcoat.2018.06.019

Cited by 25 publications

(12 citation statements)

References 34 publications

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“…The plasma-assisted chemical vapor deposition (PACVD) described in [28][29][30] was used to obtain a-C:H:SiO x films. The PACVD process was provided by the plasma generator with hot cathode.…”

Section: Preparation Of A-c:h:sio X Coatingsmentioning

confidence: 99%

In Vitro Biodegradation of a-C:H:SiOx Films on Ti-6Al-4V Alloy

et al. 2022

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This paper focuses mainly on the in vitro study of a five-week biodegradation of a-C:H:SiOx films of different thickness, obtained by plasma-assisted chemical vapor deposition onto Ti-6Al-4V alloy substrate using its pulsed bipolar biasing. In vitro immersion of a-C:H:SiOx films in a solution of 0.9% NaCl was used. It is shown how the a-C:H:SiOx film thickness (0.5–3 µm) affects the surface morphology, adhesive strength, and Na+ and Cl− precipitation on the film surface from the NaCl solution. With increasing film thickness, the roughness indices are reducing a little. The adhesive strength of the a-C:H:SiOx films to metal substrate corresponds to quality HF1 (0.5 µm in thickness) and HF2-HF3 (1.5–3 µm in thickness) of the Rockwell hardness test (VDI 3198) that defines strong interfacial adhesion and is usually applied in practice. The morphometric analysis of the film surface shows that on a-C:H:SiOx-coated Ti-6Al-4V alloy surface, the area occupied by the grains of sodium chloride is lower than on the uncoated surface. The reduction in the ion precipitation from 0.9% NaCl onto the film surface depended on the elemental composition of the surface layer conditioned by the thickness growth of the a-C:H:SiOx film. Based on the results of energy dispersive X-ray spectroscopy, the multiple regression equations are suggested to explain the effect of the elemental composition of the a-C:H:SiOx film on the decreased Na+ and Cl− precipitation. As a result, the a-C:H:SiOx films successfully combine good adhesion strength and rare ion precipitation and thus are rather promising for medical applications on cardiovascular stents and/or friction parts of heart pumps.

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Section: Preparation Of A-c:h:sio X Coatingsmentioning

confidence: 99%

In Vitro Biodegradation of a-C:H:SiOx Films on Ti-6Al-4V Alloy

et al. 2022

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“…Энергодисперсионный анализ показал, что данные частицы содержат около 32 at.% кремния, что значительно превышает его содержание в пленке. Более детальные исследования структуры формируемых a-C : H : SiO x -пленок с помощью рентгеновской фотоэлектронной, рамановской и инфракрасной спектроскопии представлены в наших предыдущих работах [31,32].…”

Section: результаты и их обсуждениеunclassified

Влияние Толщины Гидрогенизированных Углеродных Пленок, Легированных Кремнием И Кислородом, На Свойства Их Поверхности

Гренадёров¹,

Соловьев²,

Оскомов³

2021

Журнал Технической Физики

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In this work, 0.5-7 µm thick a-C:H:SiOx films were obtained on silicon and VT6 ti-tanium alloy substrates in plasma of non-self-sustained arc discharge with a hot cathode using a bipolar pulsed substrate bias voltage. The dependence of hardness, internal stress-es, surface morphology, wettability, and the surface potential a-C:H:SiOx films on the thickness was studied. It is shown that increasing the film's thickness enhances the allow-able load on the material and its hardness. The a-C:H:SiOx films had low internal stresses (less than 600 MPa), and the contact angle with water was 75–80°. It is found that an in-crease in the film thickness leads to a rise in the negative surface potential from 50 to 670 mV.

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“…On the other hand, molecular simulations of SiO 2 thin films and experimental work are in good agreement with the typical fused silica values (Kim and Kim, 2013;Chen et al, 2018), which are consistently higher than the values obtained in this work. Recently, nanomechanical properties of hybrid DLC-SiO x nanocomposites have shown a remarkable range of elastic properties achievable depending on deposition process parameters (Grenadyorov et al, 2018). However, to the best of our knowledge, there is no work that addresses nanomechanical properties of SiO x thin films from a structural point of view.…”

Section: Nanomechanical Propertiesmentioning

confidence: 99%

The Influence of Microstructure on Nanomechanical and Diffusion Barrier Properties of Thin PECVD SiOx Films Deposited on Parylene C Substrates

et al. 2019

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Plasma-enhanced chemical vapor deposition (PECVD) was used to deposit SiO x thin films of varying thicknesses on parylene C substrates, using hexamethyldisiloxane (HMDSO) as a precursor. The microstructure of SiO x coatings was analyzed using X-ray photoemission spectroscopy (XPS), nanoindentation, and spectroscopic ellipsometry. The composition ranged from oxygen-rich oxides with large silanol OH content to hybrid oxides with larger organic content, while refractive index varied from 1.45 to 1.5 depending on the specimen. Reduced moduli of coatings obtained by nanoindentation varied between 15 and 59 GPa and could be correlated with permeability to oxygen and water vapor through the existence of porosity in a broader sense. It can be concluded that the barrier properties are the result of a complex interplay of microstructural features, with porosity, silanol, and carbon content playing important roles in the final thin film properties.

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Influence of deposition conditions on mechanical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method

Cited by 25 publications

References 34 publications

In Vitro Biodegradation of a-C:H:SiOx Films on Ti-6Al-4V Alloy

In Vitro Biodegradation of a-C:H:SiOx Films on Ti-6Al-4V Alloy

Влияние Толщины Гидрогенизированных Углеродных Пленок, Легированных Кремнием И Кислородом, На Свойства Их Поверхности

The Influence of Microstructure on Nanomechanical and Diffusion Barrier Properties of Thin PECVD SiOx Films Deposited on Parylene C Substrates

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