2017
DOI: 10.1134/s1063785017040198
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A model of carbon-nanotube growth-rate limitation on thin-film catalysts

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Cited by 10 publications
(8 citation statements)
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“…Using the introduced free energy density (2) or (3), one can obtain the analytical solution of eqn (6). This quadratic equation has two solutions…”
Section: Free Energy Functional and Phase Diagram Of A Two-component ...mentioning
confidence: 99%
See 1 more Smart Citation
“…Using the introduced free energy density (2) or (3), one can obtain the analytical solution of eqn (6). This quadratic equation has two solutions…”
Section: Free Energy Functional and Phase Diagram Of A Two-component ...mentioning
confidence: 99%
“…Carbides of the metal emerge in this solution, and diffuse and decompose at the nucleation site of the CNTs. 5,6 The catalyst can form islands or particles on the substrate surface. The size of these islands determines the diameter and other properties of CNTs.…”
Section: Introductionmentioning
confidence: 99%
“…Углеродные нанотрубки (УНТ) находят широкое применение в микро-и наноэлектронике [1]. Рост вертикальных массивов углеродных нанотрубок на подложках методом Chemical Vapor Deposition (CVD) происходит с участием катализаторов, обычно, нанесенных на барьерные слои [2,3]. Результаты многочисленных исследований установили [4], что морфология, диаметр и скорость роста углеродных нанотрубок определяются катализатором [5,6].…”
Section: Introductionunclassified
“…The technological process implies formation of CNTs on the surface of nanosized catalyst particles from vapour phase. Commonly, the catalyst particles are formed from a transitive metal film deposited on silicon substrate with a buffer layer [1][2][3] that prevents interaction of silicon and the catalyst [4][5][6][7][8][9]. Interaction of the metal film and silicon substrate can cause formation of silicides and silicates that cannot play the role of catalyst for CNT growth [3,[7][8][9].…”
Section: Introductionmentioning
confidence: 99%
“…Commonly, the catalyst particles are formed from a transitive metal film deposited on silicon substrate with a buffer layer [1][2][3] that prevents interaction of silicon and the catalyst [4][5][6][7][8][9]. Interaction of the metal film and silicon substrate can cause formation of silicides and silicates that cannot play the role of catalyst for CNT growth [3,[7][8][9]. Therefore, addition of buffer layer prevents decreasing of active catalyst.…”
Section: Introductionmentioning
confidence: 99%