A method for compensating the polarization aberration of projection optics in immersion lithography

Jia, Yue; Li, Yanqiu; Liu, Lihui; Han, Chunying; Liu, Xiaolin

doi:10.1117/12.2069711

Cited by 4 publications

(2 citation statements)

References 8 publications

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“…In addition, because of low K 1 and ultrahigh NA, the simplified thin mask mode become inaccurate for lithography performance analysis [4][5][6] . The mechanism, such as large incident angle, film coatings and lens material intrinsic birefringence could induce the PA, making adverse effect on image performance [7][8] . Several representations of PA have been proposed, such as Jones pupil, physical pupil, Mueller pupil ,Pauli pupil and 3D PA [9][10][11][12][13][14] .…”

Section: Introductionmentioning

confidence: 99%

Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography

Jia

Liu

et al. 2014

SPIE Proceedings

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As the numerical aperture (NA) increasing and process factor k 1 decreasing in 193nm immersion lithography, polarization aberration (PA) of projection optics leads to image quality degradation seriously. Therefore, this work proposes a new scheme for compensating polarization aberration. By simulating we found that adjusting the illumination source partial coherent factors σ out is an effective method for decreasing the PA induced pattern critical dimension (CD) error while keeping placement error (PE) within an acceptable range. Our simulation results reveal that the proposed method can effectively compensate large PA in actual optics.

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Section: Introductionmentioning

confidence: 99%

Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography

Jia

Liu

et al. 2014

SPIE Proceedings

Self Cite

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“…A lithography process in the semiconductor industry, for example, relies on the quality of its optical system [6][7][8][9]. Reducing the feature size of a microchip from 42 to 10 nm using the ultraviolet lithography technique requires that the key optical element of the lithography system needs a flatness of 2 nm across an area of 30 cm [10].…”

Section: Introductionmentioning

confidence: 99%

Precision glass molding: Toward an optimal fabrication of optical lenses

Zhang

Liu

2017

Front. Mech. Eng.

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It is costly and time consuming to use machining processes, such as grinding, polishing and lapping, to produce optical glass lenses with complex features. Precision glass molding (PGM) has thus been developed to realize an efficient manufacture of such optical components in a single step. However, PGM faces various technical challenges. For example, a PGM process must be carried out within the super-cooled region of optical glass above its glass transition temperature, in which the material has an unstable non-equilibrium structure. Within a narrow window of allowable temperature variation, the glass viscosity can change from 10 5 to 10 12 Pa$s due to the kinetic fragility of the super-cooled liquid. This makes a PGM process sensitive to its molding temperature. In addition, because of the structural relaxation in this temperature window, the atomic structure that governs the material properties is strongly dependent on time and thermal history. Such complexity often leads to residual stresses and shape distortion in a lens molded, causing unexpected changes in density and refractive index. This review will discuss some of the central issues in PGM processes and provide a method based on a manufacturing chain consideration from mold material selection, property and deformation characterization of optical glass to process optimization. The realization of such optimization is a necessary step for the Industry 4.0 of PGM.

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Characteristic and compensation research on polarization effect from the front optical system of imaging polarimeters

Dai

2019

Optik

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A method for compensating the polarization aberration of projection optics in immersion lithography

Cited by 4 publications

References 8 publications

Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography

Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography

Precision glass molding: Toward an optimal fabrication of optical lenses

Characteristic and compensation research on polarization effect from the front optical system of imaging polarimeters

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