2007
DOI: 10.1016/j.carbon.2007.06.017
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A mechanism for carbon nanosheet formation

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Cited by 318 publications
(265 citation statements)
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“…The electric field in the plasma promotes the growth at the edge of carbon nanosheet and induces vertical growth perpendicular to the substrate's surface [10]. Many growth models have been proposed for the formation of this type of structure in literature [5,11].…”
Section: Resultsmentioning
confidence: 99%
“…The electric field in the plasma promotes the growth at the edge of carbon nanosheet and induces vertical growth perpendicular to the substrate's surface [10]. Many growth models have been proposed for the formation of this type of structure in literature [5,11].…”
Section: Resultsmentioning
confidence: 99%
“…However, due to variations in the technical details of PECVD setups the quality of the samples can be very different, as is documented in the literature. For example Wang/Zhu et al [13,[27][28][29] and Seo et al [18] used an inductively-coupled RF PECVD with 13.56 MHz, Suzuki et al [17] and Vitchev et al [30] used a MPECVD with 2.45 GHz, and Kondo et al [31] or Hiramatsu et al [20] used a capacitivelycoupled VHF (100 MHz) PECVD system with hydrogen radical injection and C 2 F 6 as carbon precursor. An overview of different methods is shown in Ref.…”
Section: Introductionmentioning
confidence: 99%
“…It should be noted that in earlier studies [19,20] it was argued and shown that such CC-PECVD with only H 2 as etchant should not be suitable for the synthesis of CNWs and FLG, due to the low plasma density and the lack of hydrogen radicals, which are proposed to have an important role in CNW formation [19,29,33]. However, Cott et al [9] later experimentally proved that it is after all possible to synthesize FLG sheets at high temperatures using such a CC-PECVD setup.…”
Section: Introductionmentioning
confidence: 99%
“…This dynamic process is expected to be fundamentally different between 2-dimensional materials (also known as van der Waals materials) and their 3-dimensional counterparts for which there exists an extensive knowledge base. Different techniques have been used to fabricate MLG including low-temperature chemical vapor deposition on Ni catalyst, 6 microwave plasma enhanced chemical vapor deposition, 8,11 and transferring and stacking large-area CVD-grown graphene monolayers. 12 To date, no proven approach allows for precise control of the number of layers presumably due to the lack of fundamental understanding of the dynamics of epitaxy.…”
mentioning
confidence: 99%