2009
DOI: 10.1063/1.3115144
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A hybrid encapsulation method for organic electronics

Abstract: We report a thin-film encapsulation method for organic electronics that combines the deposition of a layer of SiOx or SiNx (100 nm) by plasma enhanced chemical vapor deposition followed by a layer of Al2O3 (10–50 nm) by atomic layer deposition and a 1-μm-thick layer of parylene by chemical vapor deposition. The effective water vapor transmission rates of the encapsulation was (2±1)×10−5 g/m2 day at 20 °C and 50% relative humidity (RH). The encapsulation was integrated with pentacene/C60 solar cells, which show… Show more

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Cited by 82 publications
(56 citation statements)
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“…This conclusion corresponds well with the behaviour previously observed for the similar hybrid PECVD/ALD layers (100 nm SiO 2 or SiN x / 10-50 nm Al 2 O 3 ), [3] which were grown, however, at low pressure on rigid substrate.…”
Section: Experimental Partsupporting
confidence: 78%
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“…This conclusion corresponds well with the behaviour previously observed for the similar hybrid PECVD/ALD layers (100 nm SiO 2 or SiN x / 10-50 nm Al 2 O 3 ), [3] which were grown, however, at low pressure on rigid substrate.…”
Section: Experimental Partsupporting
confidence: 78%
“…This consideration is supported also by the recently highlighted remarkable performance of hybrid inorganic layers comprised of an inorganic dyad or a nano-laminate -4 -heterogeneous structures serving as diffusion barriers. [3][4][5][6][7] Nevertheless, despite the excellent barrier film properties obtained using this approach, the above-mentioned experiments were carried out at low pressure and using relatively low deposition rate solutions.…”
Section: Introductionmentioning
confidence: 99%
“…Unless otherwise noted, devices were stored in ambient air and exposed thermal annealing effect (a surface temperature of ≈ 65 ° C was measured using a thermocouple) and can only be observed in devices with low moisture and oxygen leakage. [ 39,40 ] Finally, by packaging devices with a glass cap and an epoxy seal, devices with the C 60 :LiF composite demonstrated a half-life of 2300 h under constant illumination at ≈ 65 ° C. (see Figure S5, Supporting Information). This lifetime is several times longer than what is typically reported for P3HT:PCBM devices under similar test conditions; typical device lifetimes are on the order of several hundred hours.…”
Section: :Lif Blocking Layer For Environmentally Stable Bulk Hetmentioning
confidence: 99%
“…In this sense, several solutions have been proposed such as, the employment of hybrid multilayer barriers [14,15]. However, the majority of proposed approaches have been reported only on devices fabricated on rigid substrates, and would not be suitable for the fabrication of flexible electronics [16][17][18][19][20][21][22][23].…”
Section: Introductionmentioning
confidence: 99%