2011 International Electron Devices Meeting 2011
DOI: 10.1109/iedm.2011.6131481
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A high performance phase change memory with fast switching speed and high temperature retention by engineering the Ge<inf>x</inf>Sb<inf>y</inf>Te<inf>z</inf> phase change material

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Cited by 53 publications
(62 citation statements)
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“…In the same graph, data corresponding to conventional GST are also reported for sake of comparison. D-alloy and T-alloy results are among the best so far published on high temperature PCM [5][6][7][8][9][10]. The activation energy for crystallization has been evaluated for both compounds, by finding 3.45 eV and 4.30 eV for D-alloy and T-alloy respectively.…”
Section: Thermal Stabilitymentioning
confidence: 96%
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“…In the same graph, data corresponding to conventional GST are also reported for sake of comparison. D-alloy and T-alloy results are among the best so far published on high temperature PCM [5][6][7][8][9][10]. The activation energy for crystallization has been evaluated for both compounds, by finding 3.45 eV and 4.30 eV for D-alloy and T-alloy respectively.…”
Section: Thermal Stabilitymentioning
confidence: 96%
“…Several works have recently addressed the limited retention of Phase Change Memory by proposing material engineering or dopants inclusion [5][6][7][8][9][10], but no mainstream has still been found. This paper is focused on two specific compositions in the Ge-rich region, namely D-alloy and T-alloy, whose crystallization temperature is respectively 250°C and 350°C, so definitely higher than reference GST.…”
Section: Contents Lists Available At Sciencedirectmentioning
confidence: 99%
“…On the other hand, ePCM should also feature data retention at high temperature, e.g., 150 • C in automotive applications, and during packaging, where the temperatures can rise above 250 • C for few minutes. To satisfy these tough reliability constraints, new chalcogenide materials with improved crystallization temperature were proposed, namely Ge-rich GeSbTe [6]- [8], C-doped GeTe [9] and SiO 2doped GeTe [10].…”
Section: Introductionmentioning
confidence: 99%
“…Such a stable h-phase would worsen the storage performance due to the large reset current 14 , big volume shrinkage 15 , supernormal mechanical stress 16,17 , and bad cyclability 18 . The specific local atomic arrangements in h-phase may be also an advantage in recently proposed interfacial phase change memory (iPCM) devices 19 , however in traditional T-cell structure 3 , phase change material is deposited without precision crystallographic texture control, and poor-quality interface with multiple grains in hphase requires substantially higher SET/RESET switching energy.…”
mentioning
confidence: 99%