The study of different stress on device characteristics of AlGaAs/InGaAs/GaAs PHEMTs has been researched and developed in this report. Many catastrophic degradation mechanisms such as hot-electron, gate-drain breakdown,IDS,IG,VPand gate Schottky barrier effects are discussed in detail. In addition, the accelerated testing of the temperature-dependent effects onID,Gmand Schottky barrier are examined.