A facile synthesis of shell-shaped GeOx (x≤2) islands by metal-assisted chemical etching of Ge and their optoelectronic properties

Dutta, Argha; Maiti, Paramita; Srivastava, S. K.; Som, T.

doi:10.1016/j.optmat.2022.112744

Search citation statements

Order By: Relevance

Paper Sections

Select...

Inv1

Introduction1

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2024

Publication Types

Select...

Article2

Relationship

Self Cite0

Independent2

Authors

Journals

Cited by 2 publications

(2 citation statements)

References 39 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The authors highlighted MacEtch a viable characterization tool to evaluate the oxidative-reductive potential of functionalized graphene sheets or other functional nanocarbon materials. Dutta et al 210 formed shell-shaped, micron-scale islands of Ge oxide following MacEtch in a dilute H 2 O 2 /H 2 O solution and AgNO 3 catalyst. An abundance of oxide deposits were found to increase with Ag catalyst and HF concentration.…”

Section: Invmentioning

confidence: 99%

See 1 more Smart Citation

Metal-assisted chemical etching beyond Si: applications to III–V compounds and wide-bandgap semiconductors

Znati,

Wharwood,

Tezanos

et al. 2024

Nanoscale

View full text Add to dashboard Cite

show abstract

Section: Invmentioning

confidence: 99%

“…Dutta et al 210 formed shell-shaped, micron-scale islands of Ge oxide following MacEtch in a dilute H 2 O 2 /H 2 O solution and AgNO 3 catalyst. An abundance of oxide deposits were found to increase with Ag catalyst and HF concentration.…”

Section: Introductionmentioning

confidence: 99%

Metal-assisted chemical etching beyond Si: applications to III–V compounds and wide-bandgap semiconductors

Znati,

Wharwood,

Tezanos

et al. 2024

Nanoscale

View full text Add to dashboard Cite

show abstract

Fabrication of large scale bi-layer microstructures through electrochemical nanoimprinting

Hong,

Chen,

Liu

et al. 2024

J. Micromech. Microeng.

View full text Add to dashboard Cite

Electrochemical nanoimprinting (ECNI) is a microstructure fabrication technique that combines metal-assisted chemical etching (MaCE) with nanoimprint lithography (NIL). A significant advantage of ECNI over traditional MaCE is the reusability of the stamp and excellent pattern consistency. This work studies the effects of various etchant components on etching results, discussing the associative parameters separately. Experimental results demonstrate that ECNI successfully fabricates bi-layer microstructures with flat surface morphology, where the second layer has a feature size of 40 μm and a depth of 12.5 μm. These findings highlight ECNI's potential as a scalable method for producing complex multi-layer structures, positioning it as a promising solution for large-scale microfabrication of semiconductors.

show abstract

A facile synthesis of shell-shaped GeOx (x≤2) islands by metal-assisted chemical etching of Ge and their optoelectronic properties

Cited by 2 publications

References 39 publications

Metal-assisted chemical etching beyond Si: applications to III–V compounds and wide-bandgap semiconductors

Metal-assisted chemical etching beyond Si: applications to III–V compounds and wide-bandgap semiconductors

Fabrication of large scale bi-layer microstructures through electrochemical nanoimprinting

Contact Info

Product

Resources

About