Nanoscale
 2024
DOI: 10.1039/d4nr00857j
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Metal-assisted chemical etching beyond Si: applications to III–V compounds and wide-bandgap semiconductors

Sami Znati,
Juwon Wharwood,
Kyle G. Tezanos
et al.

Abstract: Metal-assisted chemical etching of next-generation materials is catalogued in this exciting review showcasing device fabrication and successful process recipes.

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