2020
DOI: 10.1109/ted.2020.3033259
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A Drain–Source Connection Technique: Thermal Resistance Measurement Method for GaN HEMTs Using TSEP at High Voltage

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Cited by 19 publications
(7 citation statements)
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“…According to the biasing sequence in figure 2(a), a 30 s long filling process with various gate and drain voltages were applied on the device, and then the detrapping process was detected by monitoring the DVTs at conditions of (V GM ; I DM ) = (0 V; 200 mA) [21], as shown in figure 2(b). It indicated that the drain-source voltage (V DS ) was approximately 0.5 V under the above measurement conditions, and thus the power in the experiments was 0.1 W. The thermal resistance of the device was 7.3 • C W −1 with the structure function method [28], and thus the effect of the highest temperature rise of 0.73 • C can be negligible [19,29]. It can be noticed that the voltage transients in figure 2(b) gradually decreased to a steady state as time increased and can be explained as follows.…”
Section: Dvt Measurementsmentioning
confidence: 94%
“…According to the biasing sequence in figure 2(a), a 30 s long filling process with various gate and drain voltages were applied on the device, and then the detrapping process was detected by monitoring the DVTs at conditions of (V GM ; I DM ) = (0 V; 200 mA) [21], as shown in figure 2(b). It indicated that the drain-source voltage (V DS ) was approximately 0.5 V under the above measurement conditions, and thus the power in the experiments was 0.1 W. The thermal resistance of the device was 7.3 • C W −1 with the structure function method [28], and thus the effect of the highest temperature rise of 0.73 • C can be negligible [19,29]. It can be noticed that the voltage transients in figure 2(b) gradually decreased to a steady state as time increased and can be explained as follows.…”
Section: Dvt Measurementsmentioning
confidence: 94%
“…The junction temperature change of the device can be indirectly obtained by the temperature-sensitive parameter method [10]. And the transient thermal resistance of the junction to the environment at different time points can be calculated by equation (1).…”
Section: Analysis Of Input Characteristics Of Transient Response Signalsmentioning
confidence: 99%
“…The switching time between heating process and test process can be obviously shortened, thus the accuracy of temperature measurement can be improved. The detailed information of the measurement process can be found in [27][28][29].…”
Section: Sample Description and Experimental Detailsmentioning
confidence: 99%
“…In addition, with the development of the structure function method, the electrical method has become an important method of thermal reliability analysis to evaluate the thermal resistance composition of different structures in semiconductor devices [25][26][27][28][29]. The structure function method was used to analyze the temperature variation curve by electrical method, so as to extract the thermal resistance value of electronic devices and the composition of total thermal resistance, such as the thermal resistance value of chip to case, the thermal resistance value of case to atmosphere, respectively [25,26].…”
Section: Introductionmentioning
confidence: 99%