A dedicated calibration standard for nanoscale areal surface texture measurements

Koops, Richard; Veghel, Marijn van; Nes, Arthur van de

doi:10.1016/j.mee.2015.04.021

Cited by 8 publications

(6 citation statements)

References 7 publications

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“…While it is possible to draw any kind of patterns onto the mask, simple and regular geometries are desirable for its use as a calibration standard. 26,27 Repeating long, straight, parallel lines in a known direction respectively to the Si wafer were chosen in this study. Different EBL doses and varied line spacing were employed in order to establish the appropriate conditions for proper exposure, avoiding incomplete development due to insufficient doses, as well as averting overexposure and distortion/merging of pattern elements by determining the minimum line distance at which distinct features subsist when doses adequate for full exposure are employed.…”

Section: Mask Characterizationmentioning

confidence: 99%

Development of a candidate reference sample for the characterization of tip-enhanced Raman spectroscopy spatial resolution

et al. 2018

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Section: Mask Characterizationmentioning

confidence: 99%

Development of a candidate reference sample for the characterization of tip-enhanced Raman spectroscopy spatial resolution

et al. 2018

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“…This set-up is most appropriate to calibrate stand-alone probes or surface topography measuring instruments such as roughness and roundness testers. Where the system depicted in Figure 11 has a rather macroscopic size and is less appropriate for e.g., AFM calibrations, miniaturized versions have been developed for AFM vertical [67] and lateral [68] calibrations. A portable system with integrated reference laser interferometer was developed by Pisani [69] as well as by Liang [70].…”

Section: Dynamic Calibration Platformsmentioning

confidence: 99%

“…Next to the simulation of a step standard, a calibration based on sinusoidal signals is rather appropriate, as in enables a direct comparison to the surface parameter Rq or Sq. Also it enables a bandwidth check and the calibration of a proper filtering performance of the instrument [64,67]. A surface topography of a real object can be measured that is repeated as a simulated measurement using the calibration set-up.…”

Section: Dynamic Calibration Platformsmentioning

confidence: 99%

The Calibration of Displacement Sensors

Haitjema

2020

Sensors

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Displacement measuring sensors play an essential role in all aspects of dimensional metrology. They can be used for direct displacement measurements but more often they are part of a measurement system, such as an atomic force microscope, roughness tester or a coordinate measuring machine (CMM). In order to achieve traceable measurements that can be related to the meter, these sensors must be calibrated against a reference standard that is more noise- and error-free than the sensor under test. A description of the various methods to achieve the ultimate traceability, repeatability and accuracy of such a calibration system is the main part of this paper. Various interferometric methods will be reviewed including several methods that use directly a primary standard as a reference: either an iodine-stabilized laser or a frequency comb. It is shown that various methods exist to quantify or mitigate the periodic errors that are inherent to interferometric methods. Also it is shown that knowledge of this periodicity may lead to a separation of periodic and non-periodic non-linearity errors of both the calibration instrument as the sensor under test. This review is limited to small-range sensors, typically with a range <100 μm. It is concluded that today’s technology enables sound and traceable sensor calibration up to the sub-nano and even picometer level of uncertainties

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“…Humidity was kept below 20%. The z motion of the piezoscanner has been calibrated using virtual standards [ 30 ]. Due to the value of the fundamental resonance frequency of the employed cantilevers, we have focused in the resonance of the 2nd flexural mode and the 6th harmonic, which frequencies are below 2.5 MHz, since the control electronics is limited to 5 MHz.…”

Section: Simulations and Experimental Detailsmentioning

confidence: 99%

Functional dependence of resonant harmonics on nanomechanical parameters in dynamic mode atomic force microscopy

Gramazio¹,

Lorenzoni²,

Pérez‐Murano³

et al. 2017

Beilstein J. Nanotechnol.

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We present a combined theoretical and experimental study of the dependence of resonant higher harmonics of rectangular cantilevers of an atomic force microscope (AFM) as a function of relevant parameters such as the cantilever force constant, tip radius and free oscillation amplitude as well as the stiffness of the sample's surface. The simulations reveal a universal functional dependence of the amplitude of the 6th harmonic (in resonance with the 2nd flexural mode) on these parameters, which can be expressed in terms of a gun-shaped function. This analytical expression can be regarded as a practical tool for extracting qualitative information from AFM measurements and it can be extended to any resonant harmonics. The experiments confirm the predicted dependence in the explored 3-45 N/m force constant range and 2-345 GPa sample's stiffness range. For force constants around 25 N/m, the amplitude of the 6th harmonic exhibits the largest sensitivity for ultrasharp tips (tip radius below 10 nm) and polymers (Young's modulus below 20 GPa). 883

show abstract

A dedicated calibration standard for nanoscale areal surface texture measurements

Cited by 8 publications

References 7 publications

Development of a candidate reference sample for the characterization of tip-enhanced Raman spectroscopy spatial resolution

Development of a candidate reference sample for the characterization of tip-enhanced Raman spectroscopy spatial resolution

The Calibration of Displacement Sensors

Functional dependence of resonant harmonics on nanomechanical parameters in dynamic mode atomic force microscopy

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