A contribution to Frenkel's theory of condensation

Zinsmeister, G.

doi:10.1016/0042-207x(66)90349-6

Cited by 177 publications

(53 citation statements)

References 10 publications

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“…The oldest way is to write "rate-equations" which describe in a mean-field way the effect of these processes on the number of isolated particles moving on the substrate (called monomers) and islands of a given size. The first author to attempt such an approach for growth was Zinsmeister [88] in 1966, but the general approach is similar to the rate-equations first used by Smoluchovsky for particle aggregation [89]. In the seventies, many papers dealing with better mean-field approximations and applications of these equations to interpret experimental systems were published.…”

Section: B Predicting the Growth From The Selected Elementary Processesmentioning

confidence: 99%

Growth of nanostructures by cluster deposition: Experiments and simple models

1999

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This paper presents a comprehensive analysis of simple models useful to analyze the growth of nanostructures obtained by cluster deposition. After detailing the potential interest of nanostructures, I extensively study the first stages of growth (the submonolayer regime) by kinetic MonteCarlo simulations. These simulations are performed in a wide variety of experimental situations : complete condensation, growth with reevaporation, nucleation on defects, total or null clustercluster coalescence . . . . The main scope of the paper is to help experimentalists analyzing their data to deduce which of those processes are important and to quantify them. A software including all these simulation programs is available at no cost on request to the author. I carefully discuss experiments of growth from cluster beams and show how the mobility of the clusters on the surface can be measured : surprisingly high values are found. An important issue for future technological applications of cluster deposition is the relation between the size of the incident clusters and the size of the islands obtained on the substrate. An approximate formula which gives the ratio of the two sizes as a function of the melting temperature of the material deposited is given. Finally, I study the atomic mechanisms which can explain the diffusion of the clusters on a substrate and the result of their mutual interaction (simple juxtaposition, partial or total coalescence . . . ).

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Section: B Predicting the Growth From The Selected Elementary Processesmentioning

confidence: 99%

Growth of nanostructures by cluster deposition: Experiments and simple models

1999

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“…Other early contributions are those of Volmer [50], Kossel [51] and Stranski [52]. Forty years later, Zinsmeister [8,9] put down rate equations quantitatively describing this scenario. Much of the work that followed focused on the solution of these rate equations for the various cases of supersaturation and island dimensionality.…”

Section: Mean-®eld Nucleation Theorymentioning

confidence: 99%

“…1(a) shows a comparison of the approximations to the scaling law expressed in Eq. (8). We have selected a coverage of 0.12 ML, which is close to saturation, and assumed 0X25 in Eq.…”

Section: Mean-®eld Nucleation Theorymentioning

confidence: 99%

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Microscopic view of epitaxial metal growth: nucleation and aggregation

Brune

1998

Surface Science Reports

922

140

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“…The growth of the structures is driven by both thermodynamics and kinetics. When the atoms arrive to the surface, they remain mobile due to surface diffusion and can join an existing island, form a new nucleation center or eventually be desorbed [27,28]. The diffusion of atoms during film growth is driven by a gradient in the chemical potential and is a thermally activated process.…”

Section: Spreading Of Materials After Adsorptionmentioning

confidence: 99%

Analysis of the blurring in stencil lithography

et al. 2009

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A quantitative analysis of blurring and its dependence on the stencil-substrate gap and the deposition parameters in stencil lithography, a high resolution shadow mask technique, is presented. The blurring is manifested in two ways: first, the structure directly deposited on the substrate is larger than the stencil aperture due to geometrical factors, and second, a halo of material is formed surrounding the deposited structure, presumably due to surface diffusion. The blurring is studied as a function of the gap using dedicated stencils that allow a controlled variation of the gap. Our results show a linear relationship between the gap and the blurring of the directly deposited structure. In our configuration, with a material source of ∼5 mm and a source-substrate distance of 1 m, we find that a gap size of ∼10 μm enlarges the directly deposited structures by ∼50 nm. The measured halo varies from 0.2 to 3 μm in width depending on the gap, the stencil aperture size and other deposition parameters. We also show that the blurring can be reduced by decreasing the nominal deposition thickness, the deposition rate and the substrate temperature.

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A contribution to Frenkel's theory of condensation

Cited by 177 publications

References 10 publications

Growth of nanostructures by cluster deposition: Experiments and simple models

Growth of nanostructures by cluster deposition: Experiments and simple models

Microscopic view of epitaxial metal growth: nucleation and aggregation

Analysis of the blurring in stencil lithography

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