A Comparison Of The Dissolution Behavior Of Poly(P-Hydroxystyrene) With Novolac

Abstract

An examination of the literature revealed that aqueous -processable positive -working photoresists based on novolac resins have been frequently reported, while analogous resists employing poly(p -hydroxystyrene) as the binder have not. In a functional resist formulation, poly(p -hydroxystyrene) would be expected to be similar to novolac in its development characteristics; however, this is not true. The dissolution properties of these two types of binders have been examined in order to identify the crucial differences. This paper presents the determination of the dissolution kinetic expression for both polymers.Additionally, the dissolution behavior of these materials in a resist -like environment is also discussed.From the results of our study, it can be concluded that poly(p -hydroxystyrene) does not exhibit as high a discrimination between exposed and unexposed dissolution rates as does novolac. AbstractAn examination of the literature revealed that aqueous-processable positive-working photoresists based on novolac resins have been frequently reported, while analogous resists employing poly(p-hydroxystyrene) as the binder have not. In a functional resist formulation, poly(p-hydroxystyrene) would be expected to be similar to novolac in its development characteristics; however, this is not true. The dissolution properties of these two types of binders have been examined in order to identify the crucial differences. This paper presents the determination of the dissolution kinetic expression for both polymers. Additionally, the dissolution behavior of these materials in a resist-like environment is also discussed. From the results of our study, it can be concluded that poly(p-hydroxystyrene) does not exhibit as high a discrimination between exposed and unexposed dissolution rates as does novolac.

A framework for realistic image synthesis

“…Much research has gone into improving the basic boundary element method and reducing the time required at the expense of additional data structures and more memory use [6]. Consequently, computer memory and display technology usually limits the maximum input size and solution quality.…”

Dissolution Rates of Copolymers Based on 4-Hydroxystyrene and Styrene

“…In addition, it offers adequate thermal stability and etch resistance as well as high transparency in DUV range. However, in a comparison of P4HS with novolak in aqueous developers, Hanrahan and Hollis [4] concluded that the dissolution speed of this polymer in aqueous base is unacceptably high in comparison with commercial resist products.…”

A Nonaqueous Potentiometric Titration Study of the Dissociation of t-Butyl Methacrylate-Methacrylic Acid Copolymers

“…Nonetheless, nonaqueous potentiometric titration has rarely been applied to resist polymers so far, except for a few preliminary reports. 9,10 In this study, nonaqueous potentiometric titration was demonstrated for t-butyl methacrylate-methacrylic acid copolymers (Poly-(BuMA1-xMAAx), x; copolymerization ratio), which are typical polymers and are also used as a model of resist polymers. The copolymerization ratio dependence of the acid dissociation of Poly(BuMA1-xMAAx) is discussed in detail.…”