A comparative study of plasma parameters and gas phase compositions in Cl2 and HCl direct current glow discharges

Efremov, Alexander; Svettsov, V. I.; Sitanov, D. V.; Balashov, D. I.

doi:10.1016/j.tsf.2007.11.046

Cited by 23 publications

(12 citation statements)

References 22 publications

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“…First, the HCl does not form any solid phase in both volume and surface processes. Second, the HCl plasma shows much lower densities of Cl atoms compared with Cl 2 plasma under the same operating conditions 4 . This allows one to expect an improving anisotropy of the etching process.…”

Section: Introductionmentioning

confidence: 94%

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The effects of additive gases (Ar, N₂, H₂, Cl₂, O₂) on HCl plasma parameters and composition

et al. 2013

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The direct current (dc) glow discharge plasma parameters and active species kinetics in HCl-X (X = Ar, N 2 , H 2 , Cl 2 , O 2 ) mixtures were studied using both plasma diagnostics Langmuir probes and modeling. The 0-dimensional self-consistent steady-state model included the simultaneous solution of Boltzmann kinetic equation, the equations of chemical kinetics for neutral and charge particles, plasma conductivity equation and the quasi-neutrality conditions for volume densities of charged particles as well as for their fluxes to the reactor walls. The data on the steady-state electron energy distribution function, electron gas characteristics (mean energy, drift rate and transport coefficients), volume-averaged densities of plasma active species and their fluxed to the reactor walls were obtained as functions of gas mixing ratios and gas pressure at fixed discharge current.

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Section: Introductionmentioning

confidence: 94%

“…The plasma modeling was represented by the 0-dimensional self-consistent steady-state model described in our previous works 4,5 . The list of processes taken into account by the model is shown in Tables 1-5.…”

Section: Modeling Algorithm and Approachesmentioning

confidence: 99%

The effects of additive gases (Ar, N₂, H₂, Cl₂, O₂) on HCl plasma parameters and composition

et al. 2013

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“…The plasma was simulated using the joint solution of the stationary Boltzmann equation, the plasma conductivity equation, and equations of chemical kinetics for neutral and charged species. The algo rithm of the simulation is detailed elsewhere [3,7,8]. The E/N value maintaining steady state plasma was determined by equality of the electron formation and decay rates in the effective diffusion coefficient approximation.…”

Section: A M Efremov and D B Murinmentioning

confidence: 99%

“…The advantages of hydro gen chloride over other chlorinated gases include (1) a low degree of dissociation of HCl, which facilitates making an anisotropic etching profile and (2) the pos sibility of combining the effects of two channel chem ical interaction in the plasma-solid system involving chlorine and hydrogen atoms [3,4].…”

mentioning

confidence: 99%

Kinetics of heterogeneous decay of chlorine and hydrogen atoms in plasmas of HCl binary mixtures with Ar, H2, O2, and Cl2

Efremov

Murin

2015

High Energy Chem

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The heterogeneous decay kinetics of chlorine and hydrogen atoms in plasmas of HCl mixtures with Ar, H 2 , O 2 , and Cl 2 of variable initial composition have been studied using optical and spectral diagnos tics methods and plasma simulation. It has been shown that the assumption about the constant recombina tion probability is inconsistent with the behavior of calculated concentrations of atoms depending on their reduced emission intensity. Mechanisms for the effect of the initial composition of the mixtures on the recombination probability have been proposed.

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“…The contribution of charged particles in this process can be neglected due to their small concentration [3,4].…”

Section: Introductionmentioning

confidence: 99%

Electrophysical parameters and concentrations of active particles in the plasma of HCl mixtures with inert and molecular gases

Dunaev

Murin

2014

Russ Microelectron

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Electrophysical parameters in HCl-Ar, HCl-H 2 , and HCl-Cl 2 mixtures are studied under con ditions of the direct current (DC) glow discharge. It is shown that there is no increasing in the concentration of atomic chlorine in HCl-Ar and, in HCl-H 2 and there are no significant changes in the kinetics of atomic molecular processes and, therefore, in the balance of neutral particles in the plasma. The increase in the con centration of admixture gas in HCl-Cl 2 is accompanied by the monotonic increase in the concentration of chlorine atoms and the density of their flux to the surface that bounds the plasma volume.

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A comparative study of plasma parameters and gas phase compositions in Cl2 and HCl direct current glow discharges

Cited by 23 publications

References 22 publications

The effects of additive gases (Ar, N₂, H₂, Cl₂, O₂) on HCl plasma parameters and composition

The effects of additive gases (Ar, N₂, H₂, Cl₂, O₂) on HCl plasma parameters and composition

Kinetics of heterogeneous decay of chlorine and hydrogen atoms in plasmas of HCl binary mixtures with Ar, H2, O2, and Cl2

Electrophysical parameters and concentrations of active particles in the plasma of HCl mixtures with inert and molecular gases

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A comparative study of plasma parameters and gas phase compositions in Cl2 and HCl direct current glow discharges

Cited by 23 publications

References 22 publications

The effects of additive gases (Ar, N2, H2, Cl2, O2) on HCl plasma parameters and composition

The effects of additive gases (Ar, N2, H2, Cl2, O2) on HCl plasma parameters and composition

Kinetics of heterogeneous decay of chlorine and hydrogen atoms in plasmas of HCl binary mixtures with Ar, H2, O2, and Cl2

Electrophysical parameters and concentrations of active particles in the plasma of HCl mixtures with inert and molecular gases

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The effects of additive gases (Ar, N₂, H₂, Cl₂, O₂) on HCl plasma parameters and composition

The effects of additive gases (Ar, N₂, H₂, Cl₂, O₂) on HCl plasma parameters and composition