A Combined Top‐Down and Bottom‐Up Approach for Precise Placement of Metal Nanoparticles on Silicon

Choi, W. K.; Liew, T. H.; Chew, Huck Beng; Zheng, Fei; Thompson, Carl V.; Wang, Yang; Hong, Ming Hui; Wang, Xiao Dong; Li, Li; Yun, Jia

doi:10.1002/smll.200700728

Cited by 98 publications

(51 citation statements)

References 16 publications

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“…[8][9][10] Metallic nanoparticles are of interest for a wide range of applications, including magnetic memory arrays, plasmonic waveguides, and as catalysts for the growth of nanowires or nanotubes. [11,12] Within these applications, control of nanoparticle shape lends increasing functionality and selectivity. Shapecontrolled nanocrystals possess well-defined surfaces and morphologies because their nucleation and growth are controlled at the atomic level.…”

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confidence: 99%

Facile Synthesis of Polyaniline‐Polypyrrole Nanofibers for Application in Chemical Deposition of Metal Nanoparticles

Han

Wang

et al. 2008

Macromol. Rapid Commun.

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Polyaniline‐polypyrrole (PANI‐PPy) nanofibers with high aspect ratios have been synthesized by a one‐step, surfactant‐assisted chemical oxidative polymerization from mixtures of aniline (An) and pyrrole (Py) monomers. PANI‐PPy nanofibers synthesized with an excess of either PANI or PPy show similar spectral (UV‐vis and FT‐IR) characteristics as the individual homopolymers, whereas nanofibers from an equimolar mixture of An and Py display unique spectral characteristics. PANI‐PPy nanofibers undergo a spontaneous redox reaction with metal ions to produce metal nanoparticles with various morphologies and/or sizes. These findings may open new opportunities for synthesizing functional polymer nanofibers and metal nanoparticles with controllable sizes and/or morphologies.magnified image

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confidence: 99%

Facile Synthesis of Polyaniline‐Polypyrrole Nanofibers for Application in Chemical Deposition of Metal Nanoparticles

Han

Wang

et al. 2008

Macromol. Rapid Commun.

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“…The formation of linear arrays is found to be dependent on the thickness of the film relative to the length scale of corrugations on the surface consistent with earlier observations. 12,13 For films that are very thick or very thin, the spatial distribution of the droplets is nearly random. In situ experiments carried out with Ag thin film on reconstructed m-plane sapphire substrate leads to a similar linear array of nanoparticles on the surface.…”

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confidence: 99%

“…[7][8][9] Dewetting of metallic thin films is considered to be an undesirable side effect 10 that causes failure of electronic devices; 11 however, recent studies indicate that solid-state dewetting of metal films on surfaces with patterned topographies can be used to produce ordered arrays of nanoparticles. [12][13][14] Reconstructed ceramic surfaces are ideal templates owing to the highly reproducible topography that is obtained in addition to the possibility of tuning the length scale of the corrugations on the surface by suitable annealing treatments. [15][16][17] Here, we demonstrate the use of a reconstructed alumina surface to produce linear arrays of metal nanoparticles by controlled solid-state dewetting of a continuous metal film.…”

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Nanopatterning by solid-state dewetting on reconstructed ceramic surfaces

Basu¹,

Carter²,

Divakar³

et al. 2009

Applied Physics Letters

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“…3 By combining LIL and catalytic etching, large-area 3D silicon nanowire and nanofin arrays can be fabricated, which can subsequently serve as molds for imprinting of electrodes for enhanced electric-field emission. 4 Continued on next page Figure 2. Laser microlens-array (MLA) lithography was used to fabricate (a) field-emission transistor arrays on a germanium antimony tellurium surface using 800nm/100fs laser irradiation through a 23µm MLA and (b) nanodot arrays on photoresist using 248nm/23ns krypton fluoride excimer-laser irradiation through a 1µm MLA.…”

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Maskless multibeam laser irradiation enables large-area nanostructure fabrication

Hong¹

2009

SPIE Newsroom

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Laser-interference and laser microlens-array lithography provide significant resolution advances towards high-speed nanomanufacturing.Compared to other precision-engineering tools, laser irradiation has the unique advantages-as a noncontact process-of being flexible to set up and having high-speed processing capabilities in air, vacuum, or liquid environments. Therefore, laser precision engineering plays an important role in a range of industries. Importantly, lasers can be easily focused to perform smallscale procedures such as marking, drilling, recrystalizing amorphous silicon, and surface cleaning and modification, making them uniquely suited to nanoscale fabrication processes. However, to cater to the demands for ever-smaller processing resolutions, the limits imposed by optical diffraction must be overcome.We recently demonstrated that lasers operating in the near field can achieve feature resolutions equivalent to that of electron-beam lithography. 1 For example, 532nm/7ns neodymium-doped yttrium aluminium garnet laser irradiation using an atomic-force-microscopy tip, 400nm/100fs lasing with a near-field scanning-optical-microscopy tip, and excimer-laser irradiation through 1µm transparent particles self-assembled on a substrate surface can achieve resolutions as low as 10, 20, and lower than 50nm, respectively. However, these approaches are limited by critical technical challenges including extremely slow optical scanning speeds. This makes it difficult to apply them to large-area, low-cost nanomanufacturing.We have been exploring laser-interference lithography (LIL) for large-area, maskless, and noncontact nanofabrication. The underlying principle is based on interference of two coherent light beams that form a horizontal standing-wave pattern. This interference pattern is used to record the patterns on the exposed photoresist. For two-beam interference, the standing wave forms a grating pattern with a period that depends on the wavelength of the light and the half angle of the intersection of the two incident beams. The line width depends on the light-exposure dose, which can be as low as 100nm: see Figure 1(a). Using this approach, after only a few minutes of UV light exposure, followed by photoresist development and chemical etching, periodic nanoline and nanodot arrays can be created in a short time on a scale of centimeters. In contrast, other single-beam direct-writing techniques require dozens of hours to fabricate equivalent large-area nanostructures.We applied this technique to fabricate large-area plasmonic nanostructures. With the flexible tuning of LIL-exposure designs, nanodot-, nanorod-, and nanodiamond-shaped plasmonic structures can be constructed. Figure 1(b) shows such a goldsilver bimetallic structure. 2 We also successfully applied this approach to create large-area 30nm-gold-dot arrays on silicon surfaces for use in growing silicon nanowires for vertical electronic devices. 3 By combining LIL and catalytic etching, large-area 3D silicon nanowire and nanofin arrays can be fabricated,...

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A Combined Top‐Down and Bottom‐Up Approach for Precise Placement of Metal Nanoparticles on Silicon

Cited by 98 publications

References 16 publications

Facile Synthesis of Polyaniline‐Polypyrrole Nanofibers for Application in Chemical Deposition of Metal Nanoparticles

Facile Synthesis of Polyaniline‐Polypyrrole Nanofibers for Application in Chemical Deposition of Metal Nanoparticles

Nanopatterning by solid-state dewetting on reconstructed ceramic surfaces

Maskless multibeam laser irradiation enables large-area nanostructure fabrication

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