Abstract:This paper reports on 1-chip RF-MEMS tunable capacitor that equips CMOS driver circuit in the underlying layer. A Wafer Level Chip Scale Package (WLCSP) optimized for RF-MEMS is employed to minimize the module size.The MEMS actuation voltage is generated by an Actuation Voltage Generator (AVG). The boost mechanism employed in the AVG enables instant high voltage generation and reduction of the dielectric charging. The measured noise at RF frequencies is less than -120dbm, thanks to a shield metal layer formed … Show more
“…RF-MEMS tunable capacitors are more suitable for these systems than any other devices such as p-i-n diodes, silicon-on-insulator (SOI) switches, [9][10][11] or barium-strontium-titanate (BST) type tunable capacitors, 12) thanks to their low loss and excellent linearity. [13][14][15][16][17][18][19] In order to use a MEMS tunable capacitor in a transmitting system, high-power handling is needed. For example, power handling of up to +35 dBm is required in the global system for mobile communications (GSM).…”
In this paper, we report on a high-power handling RF-MEMS tunable capacitor that has a quadruple series capacitor (QSC) and a movable electrode using a slit with dielectric bridges (SDB) structure. The QSC structure consists of two fixed metal–insulator–metal (MIM) capacitors and two MEMS capacitor elements connected in series, and enables reduction of the RF voltage to the MEMS capacitors. The SDB structure is able to increase the release voltage without increasing the pull-in voltage. The combination of these structures enables improving power handling capabilities. A capacitor bank using QSC and SDB structures was fabricated by a micromachining process above CMOS control circuits. Measurement results demonstrate the excellent power handling capability up to +44 dBm for cold switching, and up to +35 dBm under hot switching. Moreover, the Q-factor of the capacitor bank is very high that is above 150 at 1 GHz, and the capacitance can be changed from 1.1 to 5.3 pF at a resolution of 4 bits by the internal control circuits thanks to monolithic integration.
“…RF-MEMS tunable capacitors are more suitable for these systems than any other devices such as p-i-n diodes, silicon-on-insulator (SOI) switches, [9][10][11] or barium-strontium-titanate (BST) type tunable capacitors, 12) thanks to their low loss and excellent linearity. [13][14][15][16][17][18][19] In order to use a MEMS tunable capacitor in a transmitting system, high-power handling is needed. For example, power handling of up to +35 dBm is required in the global system for mobile communications (GSM).…”
In this paper, we report on a high-power handling RF-MEMS tunable capacitor that has a quadruple series capacitor (QSC) and a movable electrode using a slit with dielectric bridges (SDB) structure. The QSC structure consists of two fixed metal–insulator–metal (MIM) capacitors and two MEMS capacitor elements connected in series, and enables reduction of the RF voltage to the MEMS capacitors. The SDB structure is able to increase the release voltage without increasing the pull-in voltage. The combination of these structures enables improving power handling capabilities. A capacitor bank using QSC and SDB structures was fabricated by a micromachining process above CMOS control circuits. Measurement results demonstrate the excellent power handling capability up to +44 dBm for cold switching, and up to +35 dBm under hot switching. Moreover, the Q-factor of the capacitor bank is very high that is above 150 at 1 GHz, and the capacitance can be changed from 1.1 to 5.3 pF at a resolution of 4 bits by the internal control circuits thanks to monolithic integration.
this paper presents the modeling of microfluidically tuned capacitor for RF applications. The designed structure is based on performances variations following DI water displacement between capacitor's electrodes. We have modeled the electric field and the current distribution using FEM tool for different DI water position in microchannels. The obtained results at 4.5 GHz show an important variation of electric field and current distribution that impacts the capacitor performances: the capacitance value is comprised between Cmin = 0.11 pF and Cmax = 5.76 pF, the factor value decreases from Qmax = 84.27 to Qmin = 3.99, and the resonant frequency ranges from 5.67 GHz to 19.8 GHz. Indeed, the capacitance variation reaches Tr = 5136% and the broadband ability is higher than 240%.
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