2005
DOI: 10.1016/j.biomaterials.2004.04.003
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A challenge to the conventional wisdom that simultaneous etching and resin infiltration always occurs in self-etch adhesives

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Cited by 250 publications
(161 citation statements)
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“…Hence the hardness and elastic modulus of this zone could be low. For the sound primary teeth, continuous etching of the intact dentin beneath the hybrid layer by incompletely polymerized acidic resin monomers could also have produced a zone of partially demineralized dentin with sparse resin infiltration 25,26 . This could have accounted for the low hardness values obtained from the subsurface dentin 10 µm beneath the interface in the Hybrid Bond groups (Table 2), and the One-Up Bond F Plus and Clearfil Tri-S Bond groups in the previous studies 15,16 .…”
Section: Discussionmentioning
confidence: 99%
“…Hence the hardness and elastic modulus of this zone could be low. For the sound primary teeth, continuous etching of the intact dentin beneath the hybrid layer by incompletely polymerized acidic resin monomers could also have produced a zone of partially demineralized dentin with sparse resin infiltration 25,26 . This could have accounted for the low hardness values obtained from the subsurface dentin 10 µm beneath the interface in the Hybrid Bond groups (Table 2), and the One-Up Bond F Plus and Clearfil Tri-S Bond groups in the previous studies 15,16 .…”
Section: Discussionmentioning
confidence: 99%
“…The use of self-etching adhesives favors the demineralization and infiltration of the dentin surface at the same depth, theoretically impeding adhesive failure. However, Carvalho et al [29] reported cases of nano-infiltration along the interface, suggesting that acidic monomers were gradually buffered by the mineral content of the substrate and partially conditioned the dentin. Consequently, areas or partially demineralized, although not infiltrated, dentin was produced below the hybrid layer.…”
Section: Discussionmentioning
confidence: 99%
“…Conditioning and resin monomer infiltration in enamel and dentine occur simultaneously; thus, reducing the potential for degradation over time[8] and eliminating the critical post-etch rinsing and drying steps of total etching adhesive systems. [10] Although the literature on this matter is controversial,[11] the self-etch adhesive systems reduce the technique sensitivity during handling and application. [8]…”
Section: Introductionmentioning
confidence: 99%