2018 IEEE Radio Frequency Integrated Circuits Symposium (RFIC) 2018
DOI: 10.1109/rfic.2018.8429035
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A 22nm FDSOI Technology Optimized for RF/mmWave Applications

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Cited by 112 publications
(43 citation statements)
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“…The proposed PA has the smallest active area, hence giving the best output power relative to used area. Along with [2] the proposed stacked PA is one of the first reported using 22nm CMOS SOI technology.…”
Section: Resultsmentioning
confidence: 99%
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“…The proposed PA has the smallest active area, hence giving the best output power relative to used area. Along with [2] the proposed stacked PA is one of the first reported using 22nm CMOS SOI technology.…”
Section: Resultsmentioning
confidence: 99%
“…To achieve higher data rates envisioned by the fifth generation (5G) of wireless systems, wideband systems operating at millimeter wave (mm-Wave) frequencies are required [1]. In addition, massive parallelism in the form of massive multiple-input multiple-output (MIMO) systems and phased arrays are proposed [2], [3], [4].…”
Section: Introductionmentioning
confidence: 99%
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“…Specific attention should be paid to low loss TX-RX switch that is a key element in the front-end. 22nm Fully Depleted Silicon-on-Insulator (FDSOI) technology is suitable solution for mmW integration with possibility to combine digital processing with high performance active and passive RF circuitry [1]. In addition, stacked PA structures favored in SOI based technologies allow higher power via higher supply voltages, but on the other hand can easily stress front-end switch beyond acceptable limits [2], [3].…”
Section: Introductionmentioning
confidence: 99%
“…In this paper we describe a fully integrated three-stack power amplifier (PA) at Ka-band using GLOBALFOUNDRIES 22 nm CMOS fully depleted silicon on insulator (FDSOI) technology [2]. It will be shown that by utilizing back-gate bias it is possible to affect the linearity and available output power of the proposed PA.…”
Section: Introductionmentioning
confidence: 99%